Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Quasi-surface plasma combined type slit wave guide and application thereof

A surface plasmon and slit waveguide technology, which is applied in the research field of plasmonic microwave devices, can solve the problems of large absorption loss and achieve the effect of small loss and small overall volume

Inactive Publication Date: 2015-05-06
HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL
View PDF3 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this band, commonly used materials (such as gold, silver, transparent conductive oxides, etc.) can support strong surface plasmon resonance, but the corresponding absorption loss is also very large

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Quasi-surface plasma combined type slit wave guide and application thereof
  • Quasi-surface plasma combined type slit wave guide and application thereof
  • Quasi-surface plasma combined type slit wave guide and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The present invention will be further described below in conjunction with the accompanying drawings.

[0036]The present invention introduces the periodic regulation of the wavelength scale into the surface plasmon-like slit waveguide that already has a sub-wavelength fine artificial microstructure to form a multi-scale composite slit waveguide, and its unit structure is shown in Figure 1(a) . It can be seen from Fig. 1(a) that the unit structure of the composite slot waveguide includes two sub-slot waveguides A and B. Each sub-waveguide is a surface plasmon-like slit waveguide with subwavelength artificial microstructure, and its basic unit structure is shown in Fig. 1(b). Sub-slot waveguides A and B contain n p (n p ≥2) basic unit structures, n in the accompanying drawing 1(a) p = 2 as an example, so the scale of the unit structure of the composite slot waveguide is P=2n p d. Here the magnitude of P is comparable to the effective wavelength of the surface plasmo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a quasi-surface plasma combined type slit wave guide and an application thereof. The quasi-surface plasma combined type slit wave guide has a periodic micro-structure with sub-wavelength scale and a periodic Bragg structure with wavelength scale. The multi-scale combined type slit wave guide simultaneously has characteristics of artificial micro-structural meta-material and guide wave and band gap properties similar to those of a photonic crystal. The properties of the local effective medium of the combined wave guide can be controlled through the micro-structure with the sub-wavelength scale; the wave guide body can support the micro-wave band gap and a defect mode similar to a photonic crystal energy band. The micro-wave band gap and defect mode can respectively realize band-reject filter and band-pass filter. The quasi-surface plasma combined type slit wave guide combines the dispersion relation of the quasi-surface plasma wave guide and a Bloch theory to provide the band gap figure of the combined type wave guide in a geometrical parameter space.

Description

technical field [0001] The invention belongs to the field of artificial microstructure electromagnetics and electromagnetic metamaterials, and is based on the research of similar surface plasmon polariton microwave devices. Background technique [0002] With the rapid development of information technology, the demand for information volume has grown exponentially. Electronic devices based on traditional metal interconnection technology can no longer meet the information transmission requirements of ultra-large capacity, ultra-high speed, ultra-long distance and high storage density. As an information carrier, photons have many advantages compared to electrons, such as high frequency, high transmission bandwidth, low loss, and low cost. For example, optical fiber communication has occupied an important position in the information age, and photonic devices are gradually replacing electronic devices. However, due to the relatively large size of the diffraction limit of photoni...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/122
CPCG02B6/1225G02B6/1226
Inventor 肖君军张强秦菲菲刘真真张小明
Owner HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products