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Positive-image PS-version and CTcP lithographic plate printing plate material

A lithographic printing plate and plate material technology, which is applied in the field of positive PS plates and CTcP lithographic printing plates, and can solve problems such as limitations, poor precision, and poor chemical resistance.

Inactive Publication Date: 2015-04-08
QINGDAO LANFAN NEW MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, starting from the photosensitive imaging principle of the traditional PS plate, the sensitivity and alkali water resistance, that is, after a short-time exposure of the photosensitive coating, the exposed part can be completely dissolved in the developer, and the non-exposed part has as little loss as possible.
The resolution of this balance is limited by
Moreover, whether it is a conventional PS plate or a CTcP plate, there is a problem of poor chemical resistance. The poor resistance to solvents is manifested in low printing force, poor resistance to chemical cleaning agents, and UV ink resistance. If you want to improve the above properties Generally, the baking operation is adopted. The baking operation has problems such as high temperature baking, inability to modify the plate, and poor precision. As the country's environmental protection requirements become more and more stringent, the VOC emissions of printing plants are also gradually strictly controlled, and at the same time, there is no VOC. The continuous development of emitted UV curable inks, in addition to the advantages of no VOC emissions, also has the advantages of bright color, good adaptability, and is also suitable for heat-sensitive substrates. Therefore, it is more and more important to improve the solvent resistance of the plate.

Method used

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  • Positive-image PS-version and CTcP lithographic plate printing plate material
  • Positive-image PS-version and CTcP lithographic plate printing plate material
  • Positive-image PS-version and CTcP lithographic plate printing plate material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0099] Add 31.0 g (0.36 mol) of methacrylic acid, 39.1 g (0.36 mol) of ethyl chloroformate, and 200 ml of acetonitrile into a 500 ml three-necked flask equipped with a stirring, thermometer, and constant pressure dropping funnel, and start stirring to stir the mixture. uniform. The mixture was cooled with an ice-water bath, and 36.4 g (0.36 mol) of triethylamine was added dropwise within 1 hour. After the dropwise addition, the ice-water bath was removed, and the dropping funnel was replaced with a condenser. Stirring was continued for 30 minutes at room temperature. 60.08 g (0.30 mol) of 1-(4-aminophenyl)-N-methyl-methylsulfonamide was added to the reaction mixture, and the mixture was stirred and reacted at 70° C. for 1 hour. The reaction mixture was cooled and added to 1 liter of water and stirred for 30 minutes. Then filter, beat and wash with 500ml of water, and dry to obtain 30 grams of white powdery N-[4-((N-methyl-aminosulfonyl)methyl)phenyl]-2methyl-2-acrylamide. ...

Embodiment 2

[0101] Synthesis of Acrylic Resin FSR1

[0102] In a 500ml four-necked flask, install a stirring tube, a dropping funnel, and nitrogen gas, add 105 grams of ethyl cellosolve, 0.6 g of dibenzoyl peroxide, and 15 g of the above-mentioned APDMAA, start stirring to dissolve, and add methyl Acrylic acid 11.5g, styrene 3.5g-2-hydroxyethyl methacrylate 10g, N-phenylmaleimide 5g, stirred for 10 minutes, started to heat up to 80°C, reacted for 1 hour, started to drop mixed monomers (15g of APDMAA, 11.5g of methacrylic acid, 3.5g of styrene, 10g of 2-hydroxyethyl methacrylate, 5g of N-phenylmaleimide, dissolved in 105ml of ethyl cellosolve), within 1 hour After dripping, continue to react for 4 hours. After the reaction, cool down to room temperature, add 0.5g hydroquinone (dissolved in 50ml ethyl cellosolve), stir for 10 minutes, then slowly add the reaction mixture into 4 liters of water , to obtain a white solid, filtered, cleaned three times, placed in a vacuum drying oven to dry, ...

Embodiment 3

[0104] Synthesis of Acrylic Resin FSR2

[0105]In a 500ml four-neck flask, install a stirring tube, a dropping funnel, feed nitrogen, add 105 grams of ethyl cellosolve, 0.6 g of dibenzoyl peroxide, and 15 g of the above-mentioned APDMAA, start stirring to dissolve, and add formaldehyde 13.5g of methyl acrylate, 1.5g of methacrylic acid, 10g of acrylonitrile, 5g of N-phenylmaleimide, stirred for 10 minutes, began to heat up to 80°C, reacted for 1 hour, and began to drop mixed monomers (15g of APDMAA, 13.5g of methyl methacrylate, 1.5g of methacrylic acid, 10g of acrylonitrile, 5g of N-phenylmaleimide, dissolved in 105ml of ethyl cellosolve), drop it within 1 hour Finished, continued to react for 4 hours, after the reaction finished, down to room temperature, added 0.5g hydroquinone (dissolved in 50ml ethyl cellosolve), stirred for 10 minutes, then slowly added the reaction mixture in 4 liters of water, Obtain white solid, filter, wash three times, be placed in vacuum oven and ...

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Abstract

The invention provides a positive-image PS-version and CTcP lithographic plate printing plate material. The plate material comprises a hydrophilic support body, a bottom layer and a top layer, wherein the bottom layer and the top layer cover the hydrophilic support body and are capable of being dissolved by alkali after exposure. A bottom layer photosensitive composition comprises chemical resistant functional resin, a photosensitive compound and background coloring dye, wherein a branch chain carbon atom of the chemical resistant function resin is provided with benzylsulfonyl amino and N-aromatic maleimide circulating units. The molecular weight is between 1000 and 100000. A top layer photosensitive composition consists of film-forming resin, a photosensitive compound, a photoacid generator and background coloring dye. The bottom layer and the top layer are sensitive to visible light and ultraviolet light, after being exposed by the visible light and / or ultraviolet light, the bottom layer and the top layer are developed in an alkaline solution. An exposure area is eliminated after being dissolved, and the non-exposure area is insoluble or subjected to slight corrosion and remains. The positive-image PS-version and CTcP lithographic plate printing plate material has excellent solvent resistance, high sensitivity, high resolution and good developing tolerance level and is applicable to the UV ink printing.

Description

technical field [0001] The invention belongs to the field of printing plate making, and in particular relates to a positive PS plate and a CTcP planographic printing plate material used in lithographic printing. Background technique [0002] Since the German Kalle company invented the diazonaphthoquinone positive PS plate in the 1930s, it has a history of more than 80 years. This system has always been the basic system of the commercial positive PS plate. Diazonaphthoquinone sulfonate As the photosensitive compound, the novolac resin is used as the film-forming resin, the photosensitive compound and the film-forming resin are mixed in a certain proportion, a certain amount of background coloring dye is added, and a positive PS plate photosensitive liquid is formulated with a solvent such as ethylene glycol monoalkyl ether. It is coated on an aluminum plate base with a hydrophilic grainy structure, and dried to obtain a pre-coated photosensitive plate PS plate. The photosens...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/09
CPCG03F7/004G03F7/09G03F7/095
Inventor 刘扬
Owner QINGDAO LANFAN NEW MATERIAL
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