Optical fiber F-P strain gauge based on MEMS technology and formation method thereof
An F-P and strain gauge technology, which is applied in the process of producing decorative surface effects, metal material coating process, photo-engraving process of pattern surface, etc. In order to avoid interference spectrum degradation, ensure batch consistency, and wide operating temperature range
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[0054] A structural schematic diagram of an optical fiber F-P strain gauge based on MEMS technology is shown in figure 1 As shown, the optical fiber F-P strain gauge mainly includes a F-P strain-sensitive MEMS chip 1 and a collimated beam expanding optical fiber 2;
[0055] Wherein, the structure schematic diagram of F-P strain-sensitive MEMS chip 1 is shown in Figure 2, and described F-P strain-sensitive MEMS chip 1 is made up of SOI strain beam, glass fixed pole 3 and silicon casing 4;
[0056] The SOI strain beam includes a top layer of silicon 5, an intermediate oxide layer 6, and a bottom layer of silicon 7; wherein, a patterned anti-reflection film 8 and a passivation layer 10 are deposited on one side of the bottom layer of silicon 7, and a highly reflective coating is deposited on the other side. Membrane 9; both the middle oxide layer 6 and the top layer of silicon 5 are processed with central holes, the central holes are coaxial and have the same diameter;
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