Method for manufacturing fast-recovery glass package diode with ultra-high voltage above 13,000 V
A technology of glass encapsulation and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc. It can solve the problems of large forward power loss, unsuitability for mass production, and large volume of silicon stacks, etc., and achieve reduction Encapsulation volume, high long-term working reliability, and small size effect
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[0047] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0048] combine figure 1 The flow chart of the present invention illustrates the method step of the present invention:
[0049] Step S101, providing a semiconductor substrate, the semiconductor substrate is an N-type semiconductor silicon material, and different material resistivities can be selected according to different reverse voltages. In order to ensure a reverse voltage above 13,000 volts, the voltage of a single tube must be at least Above 1500V, the resistivity of the material should be selected at 40-50Ω.cm, and the thickness of the N-type substrate should be 500μm; see figure 2 N-type silicon material layer 11;
[0050] Step S102, doping N on the N-type semiconductor substrate + Type impurities (phosphorous oxides, such a...
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