Organic light emission diode and preparation method thereof
An electroluminescence device and luminescence technology, applied in the field of electric light sources, can solve the problems of limited blocking effect, long diffusion distance, affecting the light efficiency and life of the device, etc., achieve a high qualified rate of finished products, reduce production costs, and improve production efficiency Effect
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[0048] Correspondingly, the embodiment of the present invention also provides a preparation method of the above organic electroluminescent device. The process flow chart of the method is as image 3 Therefore, see also Figure 1~2 , the method includes the following steps:
[0049] S01. Provide the substrate 1;
[0050] S02. Prepare the anode layer 2: in a vacuum system, magnetron sputtering the transparent conductive oxide on the surface of the substrate 1 in step S01 to prepare the anode layer 2;
[0051] S03. Preparation of organic functional layer 3: In step S02, the surface of the anode layer 2 opposite to the surface of the light-transmitting substrate layer 1 is prepared by sequentially vapor-depositing the hole transport layer 31, the light-emitting layer 32, the n-doped barrier layer 33 and the electron transport layer. Layer 34, forming an organic functional layer 3;
[0052] S04. Prepare the cathode layer 4: In the vacuum coating system, the cathode layer 4 is f...
Embodiment 1
[0067] An organic electroluminescent device, its structure is: glass substrate / ITO(100nm) / F6-TNAP:MeO-TPD(1%, 60nm) / TAPC(10nm) / Ir(ppy) 3 :TPBi(8%,15nm) / BAlq(5nm) / BAlq:CsN 3 (1%,5nm) / CsN 3 :Bphen(15%,40nm) / Ag(100nm).
[0068] The preparation method of the organic electroluminescence device comprises the following steps:
[0069] 1) Pre-treatment of glass substrates: ultrasonically clean the glass substrates in deionized water containing detergent, after cleaning, ultrasonically treat them in isopropanol and acetone for 20 minutes, and then dry them with nitrogen to obtain a clean transparent substrate;
[0070] 2) Preparation of anode layer: In a vacuum system, magnetron sputtering of transparent conductive oxide ITO is formed on one side of the glass substrate pre-treated in step 1) to form an anode layer. The thickness of the anode layer is 100nm, and then the anode layer is formed The layered glass substrate is placed in a plasma treatment chamber for plasma treatment;
...
Embodiment 2
[0081] An organic electroluminescence device, its structure is: glass substrate / IZO (70nm) / MoO 3 :2-TNATA(10%,30nm) / TAPC(5nm) / Ir(piq) 3 :NPB(20%,20nm) / Gaq 3 (10nm) / Gaq 3 :LiN 3 (0.5%,5nm) / LiN 3 :TPBi(5%,30nm) / Al(70nm).
[0082] Its preparation method is with embodiment 1.
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