Mask forming composition, production method for solar cell substrate, and production method for solar cell element

A technology of solar cells and manufacturing methods, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as non-power generation

Inactive Publication Date: 2014-09-24
HITACHI CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, since sunlight does not enter directly under the electrodes on the light-receiving side, no power is generated in this part.

Method used

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  • Mask forming composition, production method for solar cell substrate, and production method for solar cell element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0123] (Preparation of composition 1 for mask formation)

[0124] 10 g of tetraethoxysilane (manufactured by Tama Chemical Industries, ethyl orthosilicate), 4 g of water, 0.1 g of nitric acid, and ethanol were mixed and stirred. Next, 10 g of magnesium oxide (manufactured by Wako Pure Chemical Industries, volume average particle diameter 0.2 μm, amorphous particles) was mixed in a mortar to prepare a composition 1 for mask formation. The viscosity of this mask-forming composition 1 at 25° C. and 5 rpm was 0.2 Pa·s. In addition, the viscosity was measured by using an E-type viscometer (manufactured by Tokyo Keiki) so that the sampling amount of the composition for mask formation was 0.5 ml.

[0125] (Preparation of Phosphorus Diffusion Solution)

[0126] A 20% by mass aqueous solution of ammonium dihydrogen phosphate (manufactured by Wako Pure Chemical Industries) was prepared, and a saturated aqueous ammonium dihydrogen phosphate solution of the supernatant was used as a pho...

Embodiment 2

[0134] A mask-forming composition 2 was prepared in the same manner as in Example 1, except that 10 g of calcium oxide (manufactured by Wako Pure Chemical Industries, volume average particle diameter: 2.5 μm, amorphous particles) was used instead of magnesium oxide. The viscosity of this mask-forming composition 2 at 25° C. was 0.15 Pa·s.

[0135] It evaluated similarly to Example 1 except having used the composition 2 for mask formation instead of the composition 1 for mask formation in Example 1. The sheet resistance of the portion coated with the mask-forming composition 2 was 150Ω / □.

Embodiment 3

[0137] 10 g of tetraethoxysilane (manufactured by Tama Chemical Industries, ethyl orthosilicate), 4 g of water, and 0.1 g of nitric acid were mixed and stirred. Next, 10 g of calcium carbonate (manufactured by Kopur Chemical, volume average particle diameter 2.0 μm, amorphous particles) and α-terpine dissolved in 15% by mass of ethyl cellulose (manufactured by Dow Chemical Company, STD200) were mixed in a mortar and mortar. 20 g of alcohol (manufactured by Terpene Chemical Co., Ltd.) and 5 g of α-terpineol were stirred well to prepare a composition 3 for mask formation. The viscosity of this mask-forming composition 3 at 25° C. was 0.2 Pa·s.

[0138] The composition 3 for mask formation was spin-coated on the n-type silicon substrate, and it dried at 150 degreeC. The subsequent steps were performed and evaluated in the same manner as in Example 1. The sheet resistance of the portion coated with the mask-forming composition 3 was 180Ω / □.

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Abstract

A mask forming composition including: a silicon compound; a metal compound including an alkaline earth metal or an alkaline metal; and a dispersion medium.

Description

technical field [0001] The present invention relates to a composition for mask formation, a method for producing a substrate for a solar cell, and a method for producing a solar cell element. Background technique [0002] The manufacturing process of the conventional silicon solar cell element is demonstrated. [0003] First, in order to enhance the light trapping effect and achieve high efficiency, a p-type silicon substrate with a textured structure was prepared. Next, phosphorous oxychloride (POCl 3 ), a mixed gas atmosphere of nitrogen and oxygen at 800° C. to 900° C. for tens of minutes to form an n-type diffusion layer uniformly. Next, an electrode paste such as Ag is applied to the light-receiving surface, and an electrode paste such as aluminum is applied to the back side, followed by firing to obtain a solar cell element. [0004] However, since sunlight does not enter directly under the electrode on the light-receiving surface side, no power is generated in this ...

Claims

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Application Information

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IPC IPC(8): H01L31/0224H01L31/18
CPCH01L21/2255H01L31/022425Y02E10/50
Inventor 织田明博吉田诚人野尻刚仓田靖岩室光则野部茂冈田悠平
Owner HITACHI CHEM CO LTD
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