High-intensity magnetic field assisted pulsed laser deposition system

Abstract

The invention discloses a high-intensity magnetic field assisted pulsed laser deposition system which comprises a pulse laser, and a pulse laser deposition columnar vacuum chamber, wherein the pulse laser deposition columnar vacuum chamber comprises a double-layer jacket type columnar cavity with water cooling, the double-layer jacket type columnar cavity is placed in a boring hole of a superconducting magnet, a substrate heating platform or laser heating platform and a rotating mechanism thereof are arranged on a flange at one side of the double-layer jacket type columnar cavity, a target assembly and a moving / rotating mechanism thereof are arranged on a flange at the other side of the double-layer jacket type columnar cavity, the substrate heating platform or laser heating platform and the target assembly are positioned at the middle of a strong magnetic field of the superconducting magnet, the pulse laser deposition columnar vacuum chamber is integrally arranged on a sliding guide rail, and a closed laser guide cavity and a vacuum sealed video device guide cavity are arranged on a flange at one side. The high-intensity magnetic field assisted pulsed laser deposition system is low in manufacture cost, reasonable in structure, simple and convenient to assemble and operate, and stable and reliable in working, can be used for in-situ growth and post-annealing thermal treatment of a pulse laser deposition film under the strong magnetic field, and realizes a control function of a microstructure and a physical property of the material.

Description

technical field [0001] The invention relates to a thin film material preparation technology, in particular to a strong magnetic field assisted pulse laser deposition system. Background technique [0002] As an ideal non-contact external field driving force, the magnetic field can increase the activity of reactants, promote ion diffusion, and affect the processes of grain nucleation, growth, migration of grain boundaries, and recrystallization during material synthesis and preparation. Even the magnetic field can change the electron spin and nuclear spin state of the reactants, which may induce new chemical reaction processes, change the preferred growth mode of materials, and obtain materials with novel structures and physical properties. This magnetic field effect in material preparation is directly related to the strength of the applied magnetic field and the magnetic susceptibility of the material. Therefore, the preparation of non-(weak) magnetic materials usually requir...

AI Technical Summary

Problems solved by technology

However, this structure requires that the length of the boring of the superconducting magnet (the distance from the center of the magnetic field to the port) and the ratio of the aperture (length-to-diameter ratio) are very strict, that is, the length of the bore should be as short as possible and the diameter of the aperture should be as large as possible. A length-to-diameter ratio usually needs to be about 1:1, and there is a requirement for the uniformity of the magnetic field distribution, which will greatly increase the design difficulty and manufacturing cost of high-field superconducting magnets

If the method of intracavity mirror is adopted, the mirror is very easy to be polluted in the cavity, so that the reflected light energy will decay rapidly, and the polluted mirror is easily damaged under strong laser irradiation, so this design is hardly stable and work fine

In addition, in this patent, the substrate heating table is fixed, and the angle between the heating table (substrate surface) and the magnetic field cannot be changed, and the control effect of different magnetic field orientations on the film growth microstructure cannot be realized.

Images