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Method for manufacturing magnesium diboride superconducting thin film micro-structure through annealing

A magnesium diboride and superconducting thin film technology, which is applied in the manufacture/processing of superconductor devices, can solve the problems of inability to form magnesium diboride superconducting thin films with microstructures, poor superconducting properties of thin film microstructures, and precursor films. There are no problems such as microstructure, and the effect of high electrothermal conversion efficiency, short annealing time and high annealing efficiency is achieved

Inactive Publication Date: 2014-01-08
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] It can be seen from the invention methods of Chinese patents 201110112739.8 and 2011120328538.1 that the precursor films used in these two patents are deposited directly on a completely bare substrate, the entire precursor film is continuous, there is no microstructure on the precursor film, and after annealing It is also impossible to form a magnesium diboride superconducting film with a microstructure
In order to prepare superconducting film microstructures, processes such as glue coating, exposure, development, corrosion, degumming, and ion etching must be carried out on superconducting films prepared using patents 201110112739.8 and 2011120328538.1, so that superconducting films will inevitably It will be in contact with liquid, water vapor, high-energy ions, etc., which will eventually lead to the deterioration or even quenching of the superconducting properties of the prepared thin film microstructure.

Method used

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  • Method for manufacturing magnesium diboride superconducting thin film micro-structure through annealing
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  • Method for manufacturing magnesium diboride superconducting thin film micro-structure through annealing

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Embodiment 1

[0038] The preparation of the precursor film in this embodiment is completed in a ZZXS-500 electron beam coating machine, and the electron beam annealing is performed on a self-made EBW-6 electron beam welding machine. The precursor film is [Mg(120 )+B(80 )] 2 , that is, N=2, the film thickness is 40nm, the size of the precursor film is 10.0mm×3.0mm, and the substrate is SiC.

[0039] 1. Precursor film preparation: (1) Fix a SiC bare substrate with a size of 10.0mm×3.0mm on the sample workpiece table; (2) Fix a hollowed-out mask with microstructure on the bare substrate with a spring piece; (3) Place the sample workpiece table in the ZZXS-500 electron beam coating machine, and start vacuuming; (4) Wait for the vacuum degree to be higher than 5×10 -5 After Pa, turn on the quartz crystal thin film coating controller; (5) Evaporate layer B on the substrate until the number on the display panel of the quartz crystal thin film coating controller is 80 (6) Evaporate the Mg la...

Embodiment 2

[0048] The preparation of the precursor film in this embodiment is completed in a ZZXS-500 electron beam coating machine, and the electron beam annealing is performed on a self-made EBW-6 electron beam welding machine. The precursor film is [Mg(120 )+B(80 )] 4 , that is, N=4, the film thickness is 80nm, the size of the precursor film is 10.0mm×3.0mm, and the substrate is SiC.

[0049] 1. Precursor film preparation: (1) Fix a SiC bare substrate with a size of 10.0mm×3.0mm on the sample workpiece table; (2) Fix a hollowed-out mask with microstructure on the bare substrate with a spring piece; (3) Place the sample workpiece table in the ZZXS-500 electron beam coating machine, and start vacuuming; (4) Wait for the vacuum degree to be higher than 5×10 -5 After Pa, turn on the quartz crystal thin film coating controller; (5) Evaporate layer B on the substrate until the number on the display panel of the quartz crystal thin film coating controller is 80 (6) Evaporate the Mg la...

Embodiment 3

[0058] The preparation of the precursor film in this embodiment is completed in a ZZXS-500 electron beam coating machine, and the electron beam annealing is performed on a self-made EBW-6 electron beam welding machine. The precursor film is [Mg(120 )+B(80 )]6 , that is, N=6, the film thickness is 120nm, the size of the precursor film is 10.0mm×3.0mm, and the substrate is Si.

[0059] 1. Precursor film preparation: (1) Fix a Si bare substrate with a size of 10.0mm×3.0mm on the sample workpiece table; (2) Fix a hollowed-out mask with microstructure on the bare substrate with a spring piece; (3) Place the sample workpiece table in the ZZXS-500 electron beam coating machine, and start vacuuming; (4) Wait for the vacuum degree to be higher than 5×10 -5 After Pa, turn on the quartz crystal thin film coating controller; (5) Evaporate layer B on the substrate until the number on the display panel of the quartz crystal thin film coating controller is 80 (6) Evaporate the Mg layer...

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Abstract

The invention discloses a method for manufacturing a magnesium diboride superconducting thin film micro-structure through annealing. According to the method, electron beams are used for annealing a magnesium diboride precursor film with micro-structure patterns in a vacuum. The magnesium diboride precursor film with the micro-structure patterns is an Mg / B multi-layer film manufactured with a film masking method. Elementary substances of magnesium and boron in the precursor film undergo a chemical reaction in annealing time of a second order of magnitude, and finally, the magnesium diboride superconducting thin film micro-structure with the conversion temperature higher than 35K is generated.

Description

technical field [0001] The invention relates to a method for preparing a superconducting thin film microstructure, in particular to a method for preparing magnesium diboride (MgB 2 ) method of superconducting thin film microstructure. Background technique [0002] MgB 2 Superconducting thin films are mainly used in the processing of two types of superconducting electronic devices in the field of electronics. One is superconducting quantum devices based on Josephson superconducting junctions, such as superconducting quantum interference devices (SQUID), superconducting quantum switches, etc.; One category is microwave devices made of superconducting low-loss properties, such as resonators and filters. Currently, based on MgB 2 The preparation of microstructures such as Josephson junctions of thin films is mostly completed according to the processing sequence of preparing superconducting thin films first and then preparing microstructures (see 1. The preparation of thin fil...

Claims

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Application Information

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IPC IPC(8): H01L39/24
Inventor 孔祥东韩立薛虹李建国初明璋
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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