Method for using low-temperature plasma to prepare supported metal sulfide catalyst
A technology of metal sulfide and low-temperature plasma, which is applied in the field of material science, can solve problems such as increased operating costs, agglomeration of active phases, and reduced dispersion, and achieves the effects of short preparation time, small particle size, and high dispersion
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Embodiment 1
[0026] Weigh 3 grams of γ-Al with a particle size of 40-60 mesh 2 o 3 carrier, take 0.80 g of Cd(NO 3 ) 2 4H 2 O was dissolved in 3 ml of deionized water, the solution was slowly dropped into the carrier and stirred evenly, impregnated at room temperature for 8 hours, and then dried in an oven at 120 °C for 12 hours, the obtained catalyst precursor was marked as Cd(NO 3 ) 2 / Al 2 o 3 .
Embodiment 2
[0028] Weigh 3 grams of SiO with a particle size of 40-60 mesh 2 carrier, take 0.80 g of Cd(NO 3 ) 2 4H 2 O was dissolved in 3 ml of deionized water, the solution was slowly dropped into the carrier and stirred evenly, impregnated at room temperature for 8 hours, and then dried in an oven at 120 °C for 12 hours, the obtained catalyst precursor was marked as Cd(NO 3 ) 2 / SiO 2 .
Embodiment 3
[0030] Take by weighing 3 grams of particle size and be the gac carrier of 40-60 purpose, get 0.80 gram of Cd(NO 3 ) 2 4H 2 O was dissolved in 3 ml of deionized water, the solution was slowly dropped into the carrier and stirred evenly, impregnated at room temperature for 8 hours, and then dried in an oven at 120 °C for 12 hours, the obtained catalyst precursor was marked as Cd(NO 3 ) 2 / C.
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