Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method

A solar cell and grid electrode technology, applied in the application field, can solve the problems of increasing the recombination probability of surface emitter carriers, increasing the reflectivity of the front surface to incident light, reducing the efficiency of the emitter performance cell, and achieving pattern and size Flexible and variable, the effect of improving carrier collection efficiency, good light transmittance and electrical conductivity

Active Publication Date: 2013-10-23
SOUTH CHINA NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this large-scale grid line electrode has a significant shadow effect on the front surface of the battery, increasing the reflectance of the front surface to incident light (~15% of the total surface reflectance); and these grid lines are very large. To obtain better conductivity, the emitter on the surface of the battery is heavily doped with n++, resulting in a significant increase in the recombination probability of the surface emitter carrier, reducing the short-wave absorption rate of the battery, thereby reducing the performance of the entire emitter and the efficiency of the battery
The upper limit of the theoretical efficiency of monocrystalline silicon solar cells reaches ~33%, while the average efficiency of existing industrialized cells is about 16-20%. Traditional grid electrodes and their existing processes are one of the sources of efficiency differences.
In addition, its expensive preparation methods (screen printing, ion beam and electron beam etching, etc.) also greatly increase the cost of the battery

Method used

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  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method
  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method
  • Method for preparing solar cell silver wire grid electrode based on photolithographic mask method and liquid phase method

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Effect test

Embodiment 1

[0045] The preparation method for preparing solar cell silver wire grid electrodes on the surface of polished silicon substrate based on photolithography mask method and liquid phase method provided by this embodiment, such as figure 1 As shown, among them (1) making a photoresist template; (2) a chemical reaction occurs between the silicon substrate and the mixed solution of silver nitrate and hydrofluoric acid; (3) producing silver particles on the exposed silicon substrate between the photoresists deposition to form silver grid lines. like figure 2 (4) Remove the photoresist on the surface of the silicon substrate with a film remover; (5) Leave grid lines formed by closely arranged silver particles on the surface of the silicon substrate; (6) High temperature annealing treatment. (7) The closely arranged silver particles communicate with each other to form a silver wire grid electrode. Among them such as Figure 4 and Figure 6 shown. It includes four main steps: the ...

Embodiment 2

[0061] What this embodiment provides is based on the photolithography mask method and the liquid phase method to prepare the preparation method of solar cell micron silver wire grid electrode on the textured single crystal silicon substrate surface, such as figure 1 As shown, among them (1) making a photoresist template; (2) a chemical reaction occurs between the silicon substrate and the mixed solution of silver nitrate and hydrofluoric acid; (3) producing silver particles on the exposed silicon substrate between the photoresists (4) Use a film remover to remove the photoresist on the surface of the silicon substrate; (5) Leave a grid line formed by closely arranged silver particles on the surface of the silicon substrate; (6) High temperature annealing deal with. (7) The tightly arranged silver particles communicate with each other to form a grid electrode of micron silver wires. It includes four main steps: the first is to make a photoresist template, the second is to depo...

Embodiment 3

[0076] What this embodiment provides is based on photolithographic mask method and liquid phase method to prepare the preparation method of silver line grid electrode on the surface of textured polysilicon substrate, such as figure 1 As shown, among them (1) making a photoresist template; (2) a chemical reaction occurs between the silicon substrate and the mixed solution of silver nitrate and hydrofluoric acid; (3) producing silver particles on the exposed silicon substrate between the photoresists (4) Use a film remover to remove the photoresist on the surface of the silicon substrate; (5) Leave a grid line formed by closely arranged silver particles on the surface of the silicon substrate; (6) High temperature annealing Sintering treatment. (7) The tightly arranged silver particles communicate with each other to form a grid electrode of micron silver wires. It includes four main steps: the first is to make a photoresist template, the second is to deposit silver particles on...

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Abstract

The invention discloses a method for preparing a solar cell silver wire grid electrode based on a photolithographic mask method and a liquid phase method. The method disclosed by the invention comprises the following steps: (1) a photoresist template is manufactured: photoresist is uniformly coated on the surface of a silicon substrate by using a spin-coating method, and designed specific graphics on a mask are copied on the silicon substrate through the steps of exposure, development, hardening and the like; (2) Ag particles are deposited by using a chemical method: an electrochemical reaction method is used for depositing the Ag particles on the photoresist template; (3) the photoresist template is removed: the photoresist is removed by using a photoresist remover; and (4) the annealing and sintering are carried out, and after the closely arrayed Ag particles are heated at high temperature, the Ag electrode is formed by mutual communication. The micron-level Ag electrode prepared according to the method has excellent electroconductive performance and a lower reflecting rate, moreover, the preparation process is simple, resource consumption is less, the Ag electrode can well replace a silk screen printed electrode, the efficiency of a solar cell can be improved, and the cost can be lowered.

Description

technical field [0001] The invention belongs to the technical fields of photovoltaic application and touch display, and in particular relates to a method for preparing a silver wire grid electrode of a solar cell based on a photolithography mask method and a liquid phase method. Background technique [0002] Solar energy is an inexhaustible clean energy. With the depletion of non-renewable energy sources such as coal and oil, the research, development and utilization of solar cells are undoubtedly the current hot spots. Improving the photoelectric conversion efficiency of solar cells and reducing the preparation cost are the directions of research and development of solar cells. The transparent conductive front electrode is one of the important components in solar cells, which directly affects the fill factor and short-circuit current of the cell device, and then affects the photoelectric conversion efficiency of the cell. Generally speaking, a transparent conductive elect...

Claims

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Application Information

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IPC IPC(8): H01L31/18G03F7/20
CPCY02P70/50
Inventor 高进伟黄苑林
Owner SOUTH CHINA NORMAL UNIVERSITY
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