Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method for oxide micro/nano-structured ordered porous array through oxygen-plasma irradiation

A technology of micro-nano structure and oxygen plasma, which is applied in the field of ion plasma irradiation preparation, can solve the problems of affecting conductivity and device stability, large thin film on the substrate, unfavorable gas-sensing parameters, etc., and achieves easy operation and uniform thickness , the effect of expanding the application prospect

Active Publication Date: 2013-09-11
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the difference between the thermal expansion coefficient of the film and the substrate, it is easy to cause large cracks in the film on the substrate during the process of synthesis (heating-cooling), which affects the conductivity and the stability of the device, which is not conducive to the gas sensitivity parameters. The control of the synthesis, that is, the repeatability of the synthesis is not good, and it is difficult to carry out practical application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method for oxide micro/nano-structured ordered porous array through oxygen-plasma irradiation
  • Preparation method for oxide micro/nano-structured ordered porous array through oxygen-plasma irradiation
  • Preparation method for oxide micro/nano-structured ordered porous array through oxygen-plasma irradiation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Synthesis of Monolayer 2D Colloidal Crystal Templates:

[0029] (1) Ultrasonic clean the ordinary glass in acetone, ethanol and deionized water for 30-40 minutes respectively, and use N 2 Blow dry with air, and use ozone ultraviolet to clean for 30 minutes to obtain super-hydrophilic glass surface;

[0030](2) Place the cleaned ordinary glass on a horizontal experimental workbench, take deionized water and evenly drop it on the glass to form a water film with a thickness of 0.2mm; put polystyrene microspheres with a mass percentage of 2.5% The suspension is dispersed in the same volume of ethanol, and the mixed solution is obtained after the dispersion is uniform; the mixed solution is slowly injected along the corner of the glass covered with deionized water film until the self-assembly of PS microspheres on the air / liquid interface is completed; control Ambient temperature to 30-40° C. is supplemented with weak air flow for drying to obtain a single-layer two-dimensi...

Embodiment 2

[0034] A colloidal crystal template composed of polystyrene microspheres with a diameter of 500nm was prepared according to the method of Example 1;

[0035] Transfer and float the colloidal crystal template to the surface of the metal oxide precursor 0.05M tin tetrachloride solution, pick up the template soaked in the solution with a single crystal silicon wafer, place it flat for 5 minutes, and then dry it at 100°C 15 minutes; Then place the dried sample in an oxygen atmosphere in a plasma cleaning machine for 40 minutes of irradiation, the power is 10W, and the oxygen flow is 30sccm, to obtain the following: figure 1 (a) The single-layer crack-free ordered hole array film. Compared with the method obtained by the annealing method, the film synthesized by this method is uniform and crack-free, and has better surface superhydrophilicity. By X-ray diffraction analysis, the phase of the film synthesized by the inventive method is tin dioxide of rutile phase, such as figure 2...

Embodiment 3

[0037] A colloidal crystal template composed of polystyrene microspheres with a diameter of 1000nm was prepared according to the method of Example 1;

[0038] Transfer and float the colloidal crystal template to the surface of the metal oxide precursor 0.1M tin tetrachloride solution, pick up the template soaked in the solution with a single crystal silicon wafer, place it flat for 5 minutes, and then dry it at 110°C 20 minutes; Then place the dried sample in an oxygen atmosphere in a plasma cleaning machine for 50 minutes of irradiation, the power is 18W, and the oxygen flow is 50sccm, to obtain the following: Figure 4 The shown single-layer crack-free ordered hole array film.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Diameteraaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method for an oxide micro / nano-structured ordered porous array through oxygen-plasma irradiation. The preparation method includes a two-dimensional colloidal crystal template process and a plasma irradiation process and comprises the following concrete steps: synthesizing a single-layer two-dimensional colloidal crystal template by using a gas / liquid interfacial assembling method, wherein the two-dimensional colloidal crystal template is composed of a single microsphere with a diameter of 200 to 2000 nm; and in particular, transferring and floating the template onto the surface of a precursor solution with a concentration of 0.02 to 0.2 mol / L, taking out the template immersed in the solution, heating the template in a baking oven at a temperature of 80 to 120 DEG C for 15 to 30 min and subjecting the template to irradiation in a plasma cleaning machine in the atmosphere of oxygen for 10 to 60 min, wherein plasma power is 5.8 to 18 W. The method provided by the invention does not use any precious special apparatus and surface modification agent, has the advantages of simple and rapid preparation process, low cost, high efficiency, safety and environment friendliness and can be extensively used in fields like photonic crystals, micro / nano processing, catalysis, surface enhanced Raman scattering and sensing.

Description

technical field [0001] The invention relates to a method for preparing an oxide micro-nano structure ordered porous array by oxygen plasma irradiation, especially a method for preparing an ordered porous film with less cracks. technical background [0002] Micro / nano-structure ordered porous film, containing periodic and ordered pores, the pore size is micron or submicron scale, and the pore wall or the surface characteristic units (nanoparticles, nanowires) on the single pore are nanoscale, Its structural units (pores) are evenly distributed on the film. Due to its high degree of order and high specific surface area, this thin film has important applications in many fields (such as: photonic crystals, cell culture, information storage, drug release, etc.), and has good compatibility with semiconductor processes. If it is used as a nano-device, not only the uniformity of the film thickness can be guaranteed, but also the uniform distribution of the structural units on the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C17/23C04B41/50C04B41/85
Inventor 戴正飞李越贾丽超段国韬蔡伟平
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com