Preparation method of multilayer nano-composite-class diamond films on surface of camshaft
A diamond thin film and nanocomposite technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of thermal matching, poor structural matching, peeling and peeling, high stress, etc., to improve friction and wear , easy to magnify, reduce the effect of insufficient power
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0020] The multilayer nanocomposite diamond-like carbon film on the surface of 45# carbon steel camshaft is composed of coating substrate / Ti layer / TiSi layer / TiSiC layer / diamond like layer, and the treatment process is carried out according to the following steps: 1) The 45# carbon steel camshaft Carry out conventional degreasing and cleaning, and then perform ultrasonic cleaning in chloroform solution; (2) Put the 45# carbon steel camshaft in a multi-target composite sputtering deposition system for argon plasma sputtering cleaning, argon pressure 2 ~5Pa, bias voltage 1000~1600V, frequency 60~200KHz, 15~20min; (3) Magnetron sputtering Ti layer, metal Ti target as cathode, processing time 15~30min, bias voltage 600~1200V, frequency 60 ~160KHz; target current 12~20A, frequency 60~160KHz; (4) Magnetron sputtering TiSi layer, keep the above conditions unchanged, deposition time 10~20min; (5) Magnetron sputtering TiSiC layer (6) The hydrogen-containing diamond-like carbon film wit...
Embodiment 2
[0022] The multilayer nano-composite diamond-like film on the surface of the 80B camshaft is composed of coating substrate / Cr layer / TiCri layer / TiCrC layer / diamond-like layer. The treatment process is carried out according to the following steps: 1) The 80B camshaft is routinely degreased and cleaned, and then Ultrasonic cleaning is carried out sequentially in chloroform solution; (2) Place the 45# carbon steel camshaft in a multi-target composite sputtering deposition system for argon plasma sputtering cleaning, the argon gas pressure is 2-5Pa, and the bias voltage is 1000- 1600V, frequency 60-200KHz, 15-20min; (3) Magnetron sputtering Ti layer, metal Ti target as cathode, processing time 15-30min, bias voltage 600-1200V, frequency 60-160KHz; target current 12-20A , frequency 60-160KHz; (4) magnetron sputtering TiCr layer, keep the above conditions unchanged, deposition time 10-20min; (5) magnetron sputtering TiCrC layer, (6) close the magnetron sputtering target, Under the c...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com