Washing method of washing-difficult reworked piece of crystalline silicon solar battery
A technology for solar cells and crystalline silicon, applied in crystal growth, chemical instruments and methods, post-processing details, etc., can solve the problems of difficult rework of reworked chips, difficult cleaning of reworked chips, and difficult cleaning of reworked chips, so as to improve product qualification rate, the effect of improving the pass rate
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Embodiment 1
[0028] A method for cleaning a crystalline silicon solar cell that is difficult to rework, when the object to be cleaned is a monocrystalline silicon solar cell, it specifically includes the following steps:
[0029] The first step is to use HF solution to remove metaphosphoric acid pollution, phosphosilicate glass or fingerprints on the diffused black battery, and Si on the rainbow printed battery. 3 N 4 Membrane; the specific process is:
[0030] A. Mix HF and process pure water according to the volume ratio of 1:10 to make HF conventional cleaning solution;
[0031] B. Put the reworked sheet that is difficult to clean into the HF solution to remove metaphosphoric acid pollution, phosphosilicate glass or fingerprints on the diffused blackened battery sheet, and Si on the rainbow printed battery sheet 3 N 4 membrane;
[0032] C. Rinse with pure process water;
[0033] D. Cell drying treatment.
[0034] Step 2: Use surface etching solution to corrode the surface of the s...
Embodiment 2
[0051] A method for cleaning a crystalline silicon solar cell that is difficult to rework, the cleaning steps are similar to those in Example 1, the main difference is that the object of cleaning is a polycrystalline silicon solar cell, and the surface etching solution used for cleaning the polycrystalline silicon solar cell is composed of HF, HNO 3Prepared with process pure water, the volume fraction of HF is 15%, HNO 3 The volume fraction is 45%, the volume fraction of process pure water is 40%, the corrosion temperature is 3°C, and the corrosion time is 20s.
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