Method for producing very-long wave indium arsenide (InAs)/gallium antimonide (GaSb) second class superlattice infrared detector material
An infrared detector and very long wave technology, which is applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of difficult preparation of superlattice infrared detector materials, affecting material quality, and deteriorating interface quality, etc. Achieve the effect of avoiding interface quality deterioration, reducing dark current, and good optical properties
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[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0025] Such as figure 1 as shown, figure 1 It is a flow chart of a method for preparing a very long wave InAs / GaSb type II superlattice infrared detector material according to an embodiment of the present invention. The method uses a molecular beam epitaxy method and equipment to sequentially grow P-type doped materials on a semi-insulating GaSb substrate. Doped GaSb buffer layer, P-type doped medium wave InAs / GaSb type II superlattice layer, non-doped very long wave InAs / GaSb type II superlattice layer, N type doped medium wave InAs / GaSb type II superlattice layer The superlattice-like layer and the N-type doped InAs upper contact layer are used to obtain the very long-wave InAs / GaSb type II superlattice infrared detect...
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