Grooving and contact burying method for crystalline silicon solar cell
A solar cell and crystalline silicon technology, applied in circuits, electrical components, sustainable manufacturing/processing, etc., can solve the problems of silicon wafer damage, high cost, and high machine precision requirements, and achieve cost savings, improve efficiency, and reduce shading. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0017] A method for engraving grooves and buried gates on the surface of a crystalline silicon solar cell, comprising the following basic steps:
[0018] 1. Print a layer of protective film paint pattern on the surface of the silicon wafer after surface texturing and dry it. The thickness of the wet mask is 10um. The pattern covers the part of the surface of the silicon chip that does not need electrodes, and exposes the part of the surface of the silicon chip that needs to be grooved.
[0019] The preparation method of the above-mentioned mask paint: join ethyl cellulose resin and epoxy resin in 95% organic solvent by weight percentage 5%, dissolve completely in constant temperature water tank, temperature 75 ℃ ℃, filter through 200 meshes to obtain organic mask Film coating; above-mentioned ethyl cellulose resin and epoxy resin are proportioned with mass ratio 1: 1; above-mentioned organic solvent comprises that mass ratio is 50% propylene glycol methyl ether acetate, 20% et...
Embodiment 2
[0026] A method for engraving grooves and buried gates on the surface of a crystalline silicon solar cell, comprising the following basic steps:
[0027] 1. Print a layer of protective film coating graphics on the surface of the silicon wafer after surface texturing and dry it. The wet film thickness is 20um. The pattern covers the part of the surface of the silicon chip that does not need electrodes, and exposes the part of the surface of the silicon chip that needs to be grooved.
[0028] The preparation method of above-mentioned mask paint:
[0029] Add 40% of ethyl cellulose resin and epoxy resin to 60% organic solvent by weight percentage, dissolve completely in a constant temperature water tank at a temperature of 100°C, and filter to obtain an organic mask coating;
[0030] Above-mentioned ethyl cellulose resin and epoxy resin are proportioned with 1: 2 by weight;
[0031] The above organic solvent is a mixture of 20% butyl carbitol, 10% propylene glycol methyl ether ...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com