Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate and preparation method for color film substrate

A color filter substrate and mask technology, which is applied to the photoengraving process of the pattern surface, the original for photomechanical processing, optics, etc. Effect

Inactive Publication Date: 2020-02-18
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The embodiment of the present application provides a method for preparing a mask plate and a color filter substrate, so as to solve the technical problem that the existing mask plates are stacked too high when forming adjacent color resists of the color filter substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate and preparation method for color film substrate
  • Mask plate and preparation method for color film substrate
  • Mask plate and preparation method for color film substrate

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0038] Please refer to image 3 with Figure 4 , image 3 It is a schematic flow chart of the method for preparing the color filter substrate according to the embodiment of the present application; Figure 4 It is another schematic flowchart of the manufacturing method of the color filter substrate according to the embodiment of the present application. The embodiment of the present application also relates to a method for preparing a color filter substrate, which includes the following steps:

[0039] S1: providing a substrate;

[0040] S2: using a first mask to form a patterned first color-resist on the substrate; forming a patterned second color-resist on the substrate; forming a patterned third color-resist on the substrate; The patterned first color resistance, second color resistance and third color resistance form a color resistance layer; the first mask plate includes a first pattern part corresponding to the first color resistance, and the first pattern part Comp...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a mask plate and a preparation method for a color film substrate. The mask plate comprises a pattern part corresponding to a color resistor, and the pattern part comprises a first area corresponding to a color resistor display area and a second area corresponding to a color resistor non-display area; and at least one gap is formed in the pattern part, so that light penetrating through the gap is diffracted, and the gap is located in the second area. The gap is formed in the second area of the pattern part of the mask plate, when the mask plate is used for exposing a photoresist layer, the diffraction effect is generated when light penetrates through the gap, the shading effects of shading parts on the two sides of the gap are further reduced, the slope angles on thetwo sides of the patterned color resistor corresponding to the pattern part are increased, and the width of the slope is reduced.

Description

technical field [0001] The present application relates to a display technology, in particular to a method for preparing a mask plate and a color filter substrate. Background technique [0002] As the market demands higher display resolution. When the existing mask is designed, the size of the pixel is getting smaller and smaller, and the distance between adjacent pixel display areas is getting smaller and smaller, which can make the distance between adjacent color resists of the color filter substrate smaller and smaller, and the insufficient distance will lead to adjacent color resistance. If the stacking resistance is too high, it will affect the product quality. Contents of the invention [0003] Embodiments of the present application provide a method for preparing a mask plate and a color filter substrate, so as to solve the technical problem that the existing mask plates are stacked too high when forming color resists adjacent to the color filter substrate. [0004]...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/38
CPCG03F1/38
Inventor 刘子琪
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com