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A kind of preparation method of Wo3 hydrate nano film

A nano-film and hydrate technology, which is applied in chemical instruments and methods, crystal growth, coating, etc., can solve the problems of complex process, long preparation cycle, and difficulty in precise control, and achieve simple process equipment, short preparation cycle, and shape The effect of appearance rules

Inactive Publication Date: 2011-12-07
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the above methods, most of the equipment is expensive, the process is complicated, resource-consuming or the shape is difficult to control accurately, and the obtained crystal effect is not ideal
However, the emerging preparation methods that have risen in China in the past ten years, such as hydrothermal and solvothermal methods, have given WO 3 The preparation of nano-film has opened up a new way, but it also has the disadvantages of long preparation cycle and low repeatability

Method used

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  • A kind of preparation method of Wo3 hydrate nano film

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Effect test

Embodiment 1

[0014] Embodiment 1: 1) at first, add 20ml analytically pure hydrogen peroxide solution that volume fraction is 30% in the beaker, and beaker is placed in cold water bath, slowly, add 4g analytically pure, particle size is 200 Target tungsten powder, after the reaction is finished, collect the filtrate in the beaker and record it as solution A;

[0015] 2) Then, add deionized water to solution A so that the concentration of element W in the solution is 0.181mol / L to obtain solution B;

[0016] 3) Film substrate cleaning: the glass slide was ultrasonically oscillated in water and absolute ethanol for 10 minutes, and then mixed with 70% nitric acid and 30% hydrogen peroxide at a volume ratio of 1:1 to obtain a mixed solution , immerse the washed substrate in the mixed solution for activation treatment for 3 hours;

[0017] 4) Pour the above B solution into the microwave hydrothermal reaction kettle, the filling degree is controlled at 60%, and then put the activated substrate; ...

Embodiment 2

[0020] Embodiment 2: 1) at first, in beaker, add 20ml analytical pure hydrogen peroxide solution that the volume fraction is 30%, and beaker is placed in cold water bath, slowly, add 4g analytical pure, particle size is 200 Target tungsten powder, after the reaction is finished, collect the filtrate in the beaker and record it as solution A;

[0021] 2) Then, add deionized water to solution A so that the concentration of element W in the solution is 0.054mol / L to obtain solution B;

[0022] 3) Film substrate cleaning: ultrasonically vibrate the ITO glass plate in water and absolute ethanol for 20 minutes in turn, then mix nitric acid with a volume fraction of 70% and hydrogen peroxide with a volume fraction of 30% in a volume ratio of 1:1 to obtain a mixed solution , immerse the washed substrate in the mixed solution for activation treatment for 1.5 hours;

[0023] 4) Pour the above B solution into the microwave hydrothermal reaction kettle, control the filling degree at 40%,...

Embodiment 3

[0025] Embodiment 3: 1) at first, in beaker, add 20ml analytical pure hydrogen peroxide solution that the volume fraction is 30%, and beaker is placed in cold water bath, slowly, add 4g analytical pure, particle size is 200 Target tungsten powder, after the reaction is finished, collect the filtrate in the beaker and record it as solution A;

[0026] 2) Then, add deionized water to solution A so that the concentration of element W in the solution is 0.005mol / L to obtain solution B;

[0027] 3) Film substrate cleaning: ultrasonically vibrate the Si substrate in water and absolute ethanol for 5 minutes in sequence, then mix 70% nitric acid and 30% hydrogen peroxide at a volume ratio of 1:1 to obtain a mixture, Soak the washed substrate in the mixed solution for activation treatment for 5 hours;

[0028] 4) Pour the above B solution into the microwave hydrothermal reaction kettle, control the filling degree at 50%, and then put the activated substrate; then seal the microwave hy...

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Abstract

A preparation method of WO3 hydrate nano-film, firstly adding tungsten powder into hydrogen peroxide solution and after the reaction is over, collecting the filtrate in the beaker as solution A; adding deionized water to solution A and diluting to obtain solution B ; The substrate is activated by ultrasonic vibration in water and absolute ethanol in turn; the B solution is poured into the microwave hydrothermal reaction kettle, and then put into the activated substrate, and the temperature control mode is selected for the reaction, and after the reaction is completed, it is naturally cooled to room temperature; open the hydrothermal reactor, take out the substrate, put it into an electric heating blast drying oven to dry to obtain a WO3 hydrate nano-film. The invention can quickly prepare the WO3 hydrate nano film with hydrated molecules, because the reaction is completed in one step without subsequent treatment, the preparation period is short, the process equipment is simple, the cost is low, the obtained WO3 film has regular morphology, high crystallinity and high purity .

Description

technical field [0001] The invention belongs to the field of material preparation, in particular to a WO 3 Preparation method of hydrate nano film. Background technique [0002] As a transition metal oxide semiconductor material, nano-WO 3 Thin films are currently widely studied due to their diverse crystal morphology and interesting physicochemical properties. Especially because of its electrochromic, thermochromic, aerochromic, and photocatalytic effects, it has been widely used in many fields, such as smart window materials, solar cell devices, gas-sensitive detectors, and photocatalysts. [0003] So far, traditional nano WO 3 The preparation methods of thin films mainly include chemical vapor deposition, physical vapor deposition, magnetron sputtering, sol-gel method, etc. In the above methods, most of the equipment is expensive, the process is complicated, resource-consuming or the shape is difficult to control accurately, and the obtained crystal effect is not idea...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/23C23C26/00C30B7/10C30B29/16
Inventor 黄剑锋李嘉胤曹丽云胡宝云吴建鹏
Owner SHAANXI UNIV OF SCI & TECH
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