Polishing device and method of sapphire

Abstract

The invention relates to polishing device and method of sapphire. The polishing device comprises a laser beam, a shoe plate, a worktable and a connecting piece, wherein the worktable is provided witha stepper motor driving the worktable to make X-direction movement and a stepper motor driving the worktable to make Y-direction movement, the connecting piece is fixed on the worktable, the shoe plate is arranged on the connecting piece, and a sapphire wafer to be polished is fixed on the shoe plate; the laser beam radiates to the sapphire wafer from the upward side of the sapphire wafer to be polished, and the stepper motor driving the worktable to make the X-direction movement and the stepper motor driving the worktable to make the Y-direction movement are respectively connected with a control device. The invention controls the X-direction movement and the Y-direction movement of a workpiece and the movement track of the workpiece relative to the laser beam by regulating the incident angle of the laser beam and controlling the worktable, thereby realizing the comprehensive scanning and polishing on the surface of the sapphire wafer. The invention can remove very little material, reduce and even eliminate the influence of heat on the sapphire material, thereby obtaining a polished surface with low surface roughness and low subsurface injury degree.

Description

technical field [0001] The invention relates to a sapphire polishing device and a polishing method thereof, in particular to a polishing device and a polishing method for polishing a sapphire wafer with an ultraviolet laser, and belongs to the innovative technology of a sapphire polishing device and a polishing method thereof. Background technique [0002] Sapphire single crystal is an excellent multifunctional material with the characteristics of high hardness, high melting point, good light transmission, excellent electrical insulation, and stable chemical properties. In terms of optics, sapphire single crystal is used in the mirror window of high-energy lasers due to its good light transmission and wear resistance. At the same time, it is also one of the key materials for infrared guided weapons. In terms of electronics, it can be used as a substrate for heteroepitaxial growth of semiconductor materials or metal materials, such as epitaxial substrates for semiconductor si...

AI Technical Summary

Problems solved by technology

At present, sapphire is mainly processed by mechanical polishing, chemical mechanical polishing and other methods. These traditional contact polishing methods often cause problems such as brittle failure during the material removal process. After polishing, there are often surface scratches, pits and so on on the surface of sapphire. Defects such as subsurface cracks, polishing fog spots may also appear on the chemically polished surface, it is difficult to obtain a high-quality optical surface, and the polishing efficiency and yield are low

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