Composite ion-injection surface modification method for copper and its alloy
A composite ion and surface modification technology, applied in the field of metal materials, can solve the problem of not being able to significantly improve the surface hardness and wear resistance of copper, and achieve improved oxidation and corrosion resistance, corrosion resistance, and oxidation resistance. The effect of performance and corrosion resistance
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Embodiment 1
[0020] This embodiment 1 is implemented under the following conditions of implementation and technical requirements:
[0021] With copper with a purity of 99.9% as the substrate, nitrogen, zinc and titanium ions are implanted on the surface, and the steps are as follows:
[0022] (1) The surface of the red copper sample is polished to 1500# with SiC sandpaper, then cleaned with deionized water and absolute ethanol, and dried;
[0023] (2) Put the red copper matrix into the vacuum chamber of the ion implanter, and carry out compound ion implantation of nitrogen, zinc and titanium ions on its surface, and the implantation sequence is to implant zinc and titanium ions first, and then implant nitrogen ions. Its injection parameters are:
[0024] The vacuum degree is 1×10 -3 Pa;
[0025] The accelerating voltage of both Zn and Ti is 30kV, and the implantation dose of Zn is 3×10 17 ions / cm 2 (ions / cm 2 ), beam density 35μA / cm 2 , the target temperature is about 200℃; the Ti i...
Embodiment 2
[0030] This embodiment 2 is implemented under the following conditions of implementation and technical requirements:
[0031] With copper with a purity of 99.9% as the substrate, boron, aluminum and titanium ions are implanted on its surface, and the steps are as follows:
[0032] (1) The surface of the red copper sample is polished to 1500# with SiC sandpaper, then cleaned with deionized water and absolute ethanol, and dried;
[0033] (2) Put the red copper substrate into the vacuum chamber of the ion implanter, and perform composite ion implantation of boron, aluminum and titanium ions on its surface, and the implantation sequence is to implant aluminum and titanium ions first, and then implant boron ions. Its injection parameters are:
[0034] Vacuum degree is 5×10 -3 Pa;
[0035] The accelerating voltages of Al and Ti are both 45kV, and the implantation dose of Al is 6×10 17 ions / cm 2 (ions / cm 2 ), beam density 5μA / cm 2 , the target temperature is about 250℃; the Ti...
Embodiment 3
[0040] This embodiment 3 is implemented under the following conditions of implementation and technical requirements:
[0041] Using H70 brass as the substrate, implant nitrogen, aluminum and titanium ions on its surface, the steps are as follows:
[0042] (1) Polish the surface of the brass sample to 1200# with SiC sandpaper, then clean it with deionized water and acetone, and dry it;
[0043] (2) Put the brass matrix into the vacuum chamber of the ion implanter, and perform nitrogen, aluminum and titanium composite ion implantation on its surface. The implantation sequence is: first implant aluminum and titanium ions, and then implant nitrogen ions. The injection parameters are: the degree of vacuum is 1×10 -3 Pa;
[0044] The accelerating voltages of Ti and Al are both 40kV, and the Al implantation dose is 3×10 17 ions / cm 2 (ions / cm 2 ), beam density 25μA / cm 2 , the target temperature is about 250℃; the Ti implantation dose is 1×10 17 ions / cm 2 (ions / cm 2 ), beam de...
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