Production of isolating column of organic electroluminescent device

Abstract

The invention discloses a preparation method of a cathode isolation column of an organic electroluminescent device, which is completed by coating an organic insulating film, exposing once, and developing once. In this method, two adjacent raised columns are used to replace the original inverted trapezoidal isolation columns, so as to realize the effective isolation of adjacent pixel electrodes of the organic light-emitting device. The preparation method of the cathode isolation column in the organic electroluminescence device provided by the invention has the advantages of simplifying the process flow, saving development and corrosion materials, improving production efficiency, reducing environmental pollution, preventing device cross-effects, and the like.

Description

technical field [0001] The invention belongs to the technical field of optoelectronics, and particularly relates to the technology of cathode isolation columns in organic electroluminescent devices. technical background [0002] Organic electroluminescent devices (OLED for short) have many advantages such as fast response speed, wide viewing angle, high brightness, and rich colors, and have gradually become the most potential display device. At present, many companies and scientific research institutions at home and abroad have invested a lot of manpower and material resources. research. Organic electroluminescent devices are generally composed of a first electrode (transparent anode), a luminescent medium deposited on the first electrode, and a second electrode (cathode) deposited on the luminescent medium. The structure of the passive OLED device determines that its driving mode is two-dimensional matrix addressing. [0003] The first transparent electrode pattern is eas...

AI Technical Summary

Problems solved by technology

If photolithography is used to make the second electrode, there are some difficult problems to solve: the organic electroluminescent film is very sensitive to water vapor, which will cause the material to fail during the development and etching process; the temperature resistance of the organic electroluminescent film Relatively poor, prone to failure during the baking process of lithography

However, this method is completed by exposing once, etching silicon dioxide 14 once and etching silicon nitride 13 twice, the preparation process is complicated, and there is no need to control the process conditions

The three-layer inorganic thin film is prepared by plasma-enhanced chemical vapor deposition. The film-forming process is quite complicated, and the equipment is expensive, which is not an acceptable method.

It uses a new negative photoresist with an inverted trapezoidal line section to isolate electrodes, but the photolithography process requires high requirements, and the cost of photoresist is high, which is not suitable for large-scale production

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