Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Asymmetric-structure polyether-ether-ketone hollow fiber membrane

An asymmetric structure, polyether ether ketone technology, applied in the direction of membrane, membrane technology, non-woven fabrics, etc., can solve the problems of poor pressure resistance, poor membrane porosity and permeability, low strength of PEEK hollow fiber membrane, etc., to achieve Low environmental pollution, controllable membrane structure, and guaranteed membrane permeability

Active Publication Date: 2022-05-27
YANTAI UNIV
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the deficiencies in the prior art, the technical problem to be solved by the present invention is that the hollow fiber membrane obtained by the traditional melt spinning method is a homogeneous membrane, and the membrane porosity and permeability Poor, the phase inversion method PEEK hollow fiber membrane has low strength and poor pressure resistance, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Asymmetric-structure polyether-ether-ketone hollow fiber membrane
  • Asymmetric-structure polyether-ether-ketone hollow fiber membrane
  • Asymmetric-structure polyether-ether-ketone hollow fiber membrane

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0026] The present invention provides an asymmetrical structure PEEK hollow fiber membrane and a method for preparing it, wherein the method comprises the following steps:

[0027]Step 1: Mix the pre-dried complete PEEK resin, blended polymer and plasticizer and extruded and granulated by extruder to obtain a uniform spinning granule;

[0028] The blended polymer is polyetherimide, polyethylene oxide, polyimide, polyarylene sulfone, polyethersulfone, polyphenylene sulfone and at least one of polyaryl esters;

[0029] The plasticizer is a high boiling point solvent, is diphenyl sulfone, diphenyl isophthalate, diphenyl terephthalate and benzophenone at least one;

[0030] The ratio is PEEK resin 30 ~ 60 wt%, blended polymer 30 ~ 60 wt, plasticizer 10 ~ 40 wt, the sum of each component is 100%;

[0031] Step 2, set the screw spinning machine feeding speed, host speed, metering pump speed, high temperature channel length and temperature, air cooling length, the first and second channe...

Embodiment 1

[0037] (1) Pre-dried complete 45 wt% PEEK resin, 45 wt% polyetherimide, 10 wt% diphenyl sulfone by high-speed mixer fully mixed and then extruded at 340 °C to obtain spinning granules;

[0038] (2) Set the screw spinning machine feeding speed 15 r / min, the main machine speed 8 r / min, the metering pump speed 18 r / min, the high temperature channel length 40 cm, the temperature 280 °C, the air cooling temperature 15 °C, the length 50 cm, the roller rate (diameter 15 cm) 8r / min, the first tensile rate 15 r / min, the second stretch rate 25 r / min, infrared heating temperature 200 °C, winding (diameter 55 cm) rate 20r / min, The particles are melted at 340 °C by the screw extruder through the automatic feeder, quantitatively extruded by the hollow spinneret assembly, the nitrogen temperature is 25 °C inside the component, and the spinning melt is successively passed through the high temperature Yongdao, air-cooled Yongdao, stretching, shaping winding, dichloromethane and ethanolamine extrac...

Embodiment 2

[0044] (1) Pre-dried 44 wt% PEEK resin, 46 wt% polyimide, 10 wt% diphenyl isophthalate by high-speed mixing machine fully mixed and then extruded at 340 °C to obtain spinning pellets;

[0045] (2) Set the screw spinning machine feeding speed 15 r / min, the main machine speed 10 r / min, the metering pump speed 20 r / min, the high temperature channel length 50 cm, the temperature 300 °C, the air cooling 25 °C, the length 40 cm, the rotary roller rate (diameter 15 cm) 8 r / min, the first stretch rate 15 r / min, the second stretch rate 25 r / min, infrared heating temperature 200 °C, winding (diameter 55 cm) rate 20 r / min, The particles are melted at 340 °C by the screw extruder through the automatic feeder, quantitatively extruded by the hollow spinneret assembly, the nitrogen temperature is 25 °C inside the component, and the spinning melt is successively passed through the high temperature yongdao, air-cooled Yongdao, stretching, stereotyping winding, N-methylpyrrolidone extraction, clean...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
breaking strengthaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a polyether-ether-ketone hollow fiber membrane with an asymmetric structure. The PEEk hollow fiber membrane has an asymmetric structure with a loose outer surface and a compact inner surface, and the outer diameter of the PEEk hollow fiber membrane is 0.4-0.5 mm. The preparation method comprises the following steps: A, uniformly mixing the PEEK resin, the polymer blend and the plasticizer, extruding by an extruder, and dicing to obtain spinning granules; and B, melting the particles through an automatic feeding machine and a screw extruder at 330-380 DEG C, quantitatively extruding through a hollow spinning assembly, introducing inert gas into the assembly, and sequentially passing a spinning melt through a high-temperature channel and an air-cooling channel, stretching, sizing and winding, extracting and washing, cleaning and drying to obtain the PEEK hollow fiber membrane with the asymmetric structure. According to the invention, the defects of poor membrane porosity and permeability of a homogeneous membrane are overcome, and the problems of low strength, poor pressure resistance and the like of a phase inversion hollow fiber membrane are solved.

Description

Technical field [0001] The present invention relates to the field of membrane technology, in particular an asymmetric structure polyetheretherketone hollow fiber membrane and preparation method thereof. Background [0002] Polyetheretherketone (PEEK) is a semi-crystalline thermoplastic high temperature resistant engineering plastic, its decomposition temperature of up to 560 °C, continuous use temperature of up to 256 °C, to 300 °C can still maintain excellent mechanical properties, while having excellent chemical corrosion resistance and mechanical properties, both inorganic film high stability and polymer film low manufacturing cost advantages, so it is considered to be the ideal material for the preparation of high-performance hollow fiber film. [0003] U.S. Patent US4992485 ISEK is dissolved in methanesulfonic acid, trifluoromethanesulfonic acid or concentrated sulfuric acid mixed acid to prepare PEEK hollow fiber membrane, however these acids are expensive, corrosive, toxic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/82B01D69/02B01D69/08B01D69/10B01D67/00D04H1/4391
CPCB01D71/82B01D69/02B01D69/088B01D69/10B01D67/0027D04H1/43914B01D2325/023B01D2325/24
Inventor 黄岩赵玉潮杨浩翟哲王清强金楠
Owner YANTAI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com