Groove PiN type beta irradiation battery with gate electrode surface field and preparation method of groove PiN type beta irradiation battery

A gate electrode and surface field technology, applied in the field of microelectronics, can solve the problems of increasing the saturation current of PiN devices, enhancing the negative impact of surface recombination, and limiting energy conversion efficiency, so as to reduce the saturation current, reduce recombination, and weaken device surface recombination The effect of action

Pending Publication Date: 2022-01-28
XIDIAN UNIV
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Problems solved by technology

[0005] However, in existing reports, the energy conversion efficiency of silicon carbide diode devices under ideal conditions can reach 23.5%, which is much higher than the experimental results. The main reason is that the energy deposition of β rays in silicon carbide materials decays exponentially with the incident depth. , the electron-hole pairs generated by a large amount of irradiation are located within 1 μm of the device surface, which leads to the surface recombination of SiC PiN devices and the thickness of the dead layer in the P-type region will have a significant impact on its energy conversion efficiency
[0006] See figure 1 , figure 1 A schematic structural diagram of a conventional silicon carbide PiN-type β-irradiated battery provided for the prior art. The PIN nuclear battery is sequentially composed of a radioactive source 60, a P-type ohmic contact electrode 50, and a P-type highly doped SiC layer. 30. Intrinsic i-layer 20, n-type highly doped SiC substrate 10 and N-type ohmic contact electrode 40; the surface recombination of the P-type highly doped SiC layer 30 on the one hand reduces the electrons generated by β rays in the semiconductor- The collection efficiency of the hole pairs leads to a decrease in the short-circuit current Isc, and on the other hand increases the saturation current of the PiN device, resulting in a decrease in the open-circuit voltage Voc and the fill factor FF; its relatively thick P-type highly doped SiC layer 30 While increasing the dead layer loss, it will further enhance the negative impact of surface recombination
However, the maximum output power of the β-irradiated battery Pout=FF·Isc·Voc, so the surface recombination and the thickness of the dead layer in the P-type region will limit the energy conversion efficiency of the silicon carbide PiN-type β-irradiated battery

Method used

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  • Groove PiN type beta irradiation battery with gate electrode surface field and preparation method of groove PiN type beta irradiation battery
  • Groove PiN type beta irradiation battery with gate electrode surface field and preparation method of groove PiN type beta irradiation battery
  • Groove PiN type beta irradiation battery with gate electrode surface field and preparation method of groove PiN type beta irradiation battery

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Embodiment 1

[0059] See figure 2 , figure 2 A schematic structural diagram of a grooved PiN type β-irradiated cell with a gate electrode surface field provided by an embodiment of the present invention. The irradiation battery includes: a PiN unit and a radioisotope unit located on the PiN unit.

[0060] PiN unit includes N-type doped 4H-SiC substrate 1, N-type doped 4H-SiC epitaxial layer 2, P-type doped 4H-SiC epitaxial layer 3, N-type ohmic contact electrode 4, isolation passivation layer 5, trench A trench passivation layer 6 , a P-type ohmic contact electrode 7 , several trench regions 9 and a gate electrode 10 .

[0061] Specifically, the shape of the PiN unit can be square or circular. When the PiN unit is square, its mesa area is 0.5×0.5cm~1.0×1.0cm; when the PiN unit is circular, its mesa area is Φ0.5cm ~Φ1.0cm; but the shape and area of ​​the PiN unit are not limited to the above description, for example, the shape of the PiN unit can also be rectangle, trapezoid, etc.

[0...

Embodiment 2

[0106] On the basis of Example 1, please refer to Figure 6a-Figure 6m , Figure 6a-Figure 6m It is a process schematic diagram of a method for preparing a grooved PiN-type β-irradiated cell with a gate electrode surface field provided by an embodiment of the present invention. The preparation method comprises steps:

[0107] S1. Epitaxial growth of N-type doped 4H-SiC epitaxial layer 2 on N-type doped 4H-SiC substrate 1, see Figure 6a and Figure 6b .

[0108] First, the N-type doped 4H-SiC substrate 1 sample is cleaned to remove surface pollutants.

[0109] Then, use chemical vapor deposition CVD to epitaxially grow a layer with a doping concentration of 1×10 on the cleaned N-type highly doped 4H-SiC substrate 1 sample surface. 14 ~1×10 15 cm -3 N-type low-doped 4H-SiC with a thickness of 4.0-10.0 μm forms an N-type doped 4H-SiC epitaxial layer 2 .

[0110] S2. Epitaxial growth of P-type doped 4H-SiC epitaxial layer 3 on N-type doped 4H-SiC epitaxial layer 2, please...

Embodiment 3

[0133] On the basis of Example 2, please combine Figure 4a and Figure 6a-Figure 6m , this embodiment takes a grooved silicon carbide PiN-type β-irradiated cell with finger-shaped distributed P-type regions and a gate electrode surface field as an example to illustrate its preparation method, wherein the cell area is 0.6×0.6 cm, and the groove The width is 405 μm, the width of the first vertical rectangular strip 72, the first horizontal rectangular strip 73, the second vertical rectangular strip 101, and the second horizontal rectangular strip 102, that is, the electrode width is 20 μm, and the number of the first vertical rectangular strip 72 is 14, The number of second longitudinal rectangular strips 101 in the gate electrode 10 is 195, 15 second longitudinal rectangular strips 101 are arranged between adjacent first longitudinal rectangular strips 72, and the distance between adjacent second longitudinal rectangular strips 101 is h2 is 5 μm, the number of the first horiz...

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Abstract

The invention relates to a groove PiN type beta irradiation battery with a gate electrode surface field and a preparation method thereof, and the irradiation battery comprises a PiN unit and a radioactive isotope unit located on the PiN unit. Each PiN unit comprises an N-type doped 4H-SiC substrate, an N-type doped 4H-SiC epitaxial layer, a P-type doped 4H-SiC epitaxial layer, an N-type ohmic contact electrode, an isolation passivation layer, a groove passivation layer, a P-type ohmic contact electrode, a plurality of groove regions and a gate electrode, and the groove regions penetrate through the P-type doped 4H-SiC epitaxial layer and are distributed in the N-type doped 4H-SiC epitaxial layer at intervals; the P-type doped 4H-SiC epitaxial layer is enabled to to form a distributed P-type region; the groove passivation layer covers the surface of the groove region; the P-type ohmic contact electrode is located on the distributed P-type region and is adjacent to the isolation passivation layer; and the gate electrode is positioned above the groove passivation layer and is distributed with the P-type ohmic contact electrode in a staggered manner. The irradiation battery achieves the purpose of improving the energy conversion efficiency of the beta irradiation battery.

Description

technical field [0001] The invention belongs to the technical field of microelectronics, and in particular relates to a trench PiN type beta irradiation battery with a grid electrode surface field and a preparation method. Background technique [0002] Micronuclear batteries or radioisotope batteries have many advantages such as small size, light weight, long service life, easy integration, and work not affected by the external environment. They can be used to solve aerospace deep space exploration, artificial heart pacemakers, portable mobile electronic products , implanted microsystems, etc., are considered to be one of the ideal long-term energy sources for micro-electric applications such as micro-electro-mechanical systems (MEMS) and sensors. [0003] β-irradiated battery is a kind of 3 H. 63 Ni and 147 A semiconductor isotope battery that outputs electrical energy through the radiant volt effect of beta (β-Particle) rays emitted by radioactive isotopes such as Pm. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21H1/06
CPCG21H1/06
Inventor 韩超袁飞霞郭辉钱驰文张玉明袁昊
Owner XIDIAN UNIV
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