Bonding pretreatment method for aluminum alloy workpiece
A technology for aluminum alloys and workpieces, which is applied in the field of thermal control adhesive bonding pretreatment of aluminum alloy skins for space operations, and can solve problems such as low hemispherical emissivity and low solar light absorption rate
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Embodiment 1
[0031] Example 1: 6 series aluminum alloy
[0032] (1) Workpiece pre-processing:
[0033] Degreasing, water washing, alkali etching, water washing, neutralization, and water washing are carried out sequentially to the aluminum alloy workpiece; wherein, in the step (1), the degreasing is ultrasonic degreasing, and the formula of the degreasing solution used during the degreasing treatment is: Na 3 PO 4 30g / L, NaOH 10g / L and NaOH 2 SO 4 14g / L; the degreasing treatment temperature is 55°C, and the degreasing treatment time is 7min.
[0034] Wherein, in the step (1), the formula of the alkali etching solution used in the alkali etching treatment is: NaOH 75g / L; the alkali etching treatment temperature is 50°C, and the alkali etching treatment time is 30s.
[0035] Wherein, in the step (1), the formula of the neutralizing solution adopted during the neutralization treatment is: HNO 3 230g / L, H 2 o 2 100g / L; the neutralization treatment temperature is 20°C, and the neutral...
Embodiment 2
[0042] Example 2: 5 series aluminum alloy
[0043] (1) Workpiece pre-processing:
[0044] Degreasing, water washing, alkali etching, water washing, neutralization, and water washing are carried out sequentially to the aluminum alloy workpiece; wherein, in the step (1), the degreasing is ultrasonic degreasing, and the formula of the degreasing solution used during the degreasing treatment is: Na 3 PO 4 30g / L, NaOH 10g / L and NaOH 2 SO 4 14g / L; the degreasing treatment temperature is 50°C, and the degreasing treatment time is 7min.
[0045] Wherein, in the step (1), the formula of the alkali etching solution used in the alkali etching treatment is: NaOH 75g / L; the alkali etching treatment temperature is 50°C, and the alkali etching treatment time is 30s.
[0046] Wherein, in the step (1), the formula of the neutralizing solution adopted during the neutralization treatment is: HNO 3 230g / L, H 2 o 2 100g / L; the neutralization treatment temperature is 20°C, and the neutral...
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