Formation method of semiconductor structure
A semiconductor and gate structure technology, applied in the field of semiconductor structure formation, can solve the problems of easy short circuit of interconnect structure, open circuit between interconnect structure and device, affecting the performance and reliability of semiconductor device, etc., so as to improve performance and reliability, improve Graphics Accuracy, Performance-Boosting Effects
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[0033] As mentioned in the background art, the performance and reliability of semiconductor devices are affected because the formed interconnection structures are easily short-circuited, or the formed interconnection structures and devices are easily disconnected. Now analyze and illustrate in conjunction with specific embodiment.
[0034] It should be noted that the "surface" in this specification is used to describe the relative positional relationship in space, and is not limited to direct contact.
[0035] Figure 1 to Figure 2 It is a structural schematic diagram of each step in the formation process of a semiconductor structure.
[0036] Please refer to figure 1 , providing a substrate, the substrate includes a first region I and a second region II, the substrate further includes a base 100 and several fins (not shown) separated from each other on the surface of the base 100, and, There are several source-drain doped layers 101 between adjacent fins; several gate stru...
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