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Exhaust gas treatment device and exhaust humidity control method thereof

A technology of waste gas treatment device and control method, which is applied in the field of pan-semiconductors, and can solve the problems of not being obvious, reducing the effect of gas humidity, and requiring large flow of cold water, etc.

Active Publication Date: 2022-05-17
BEIJING JINGYI AUTOMATION EQUIP CO LTD
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Problems solved by technology

[0006] 2) The condensing device creates an environment below room temperature through the cooling water (PCW) in the exhaust pipe, condenses the water in the gas in the exhaust gas treatment device, and discharges it to the plant service end. This method requires a large flow of cold water. The effect of reducing the humidity of the gas is not very obvious

Method used

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  • Exhaust gas treatment device and exhaust humidity control method thereof
  • Exhaust gas treatment device and exhaust humidity control method thereof
  • Exhaust gas treatment device and exhaust humidity control method thereof

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Embodiment Construction

[0026] Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this application will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals denote the same or similar parts in the drawings, and thus their repeated descriptions will be omitted.

[0027] The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure. However, those skilled in the art will appreciate that the technical solutions of the present disclosure may be practiced without one or more of these ...

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Abstract

The present application provides an exhaust gas treatment device and an exhaust humidity control method thereof, which are used for treating exhaust gas produced by semiconductor manufacturing processes. An exhaust gas treatment device includes a reaction chamber, a water tank, a water washing system, a humidity meter, and an exhaust gas pipeline connected in sequence; the water washing system is provided with a water pump, a regulating valve, and a temperature detector; The water is pumped out and enters the water washing system through the regulating valve; the temperature detector is used to detect the temperature of the washed gas in the water washing system; the humidity meter is used to detect the gas discharged from the water washing system humidity. The exhaust gas treatment device of this application increases the gas moisture monitoring of the exhaust pipeline, and uses the regulating valve to adjust the opening of the waterway spray, thereby controlling the amount of water sprayed by the pipeline and controlling the exhaust humidity below a reasonable standard.

Description

technical field [0001] The present invention relates to the field of pan-semiconductor technology, in particular to an exhaust gas treatment device and an exhaust humidity control method thereof, which are used for treating exhaust gas generated by semiconductor manufacturing processes. Background technique [0002] In the development of semiconductor science and technology, a large number of raw materials such as toxic, corrosive and flammable special gases, chemicals and organic solvents are used in the production of semiconductor manufacturing processes. , because the nature of the gas may cause air duct blockage, pipeline corrosion, etc., resulting in gas leakage, fire and explosion accidents, so it should be treated at the nearest small waste gas treatment equipment (Local Scrubber) before entering the central processing system for treatment . [0003] Water is used in waste gas treatment equipment to cool down the treated gas or to dissolve gas dissolved in water. Th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/74B01D53/18B01D53/14B01D53/30
CPCB01D53/74B01D53/18B01D53/1406B01D53/30B01D53/1412B01D2258/02B01D2252/103
Inventor 杨春涛杨春水张坤王继飞
Owner BEIJING JINGYI AUTOMATION EQUIP CO LTD
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