Perovskite solar cell based on p-methoxyphenylacetic acid passivator
A technology of p-methoxybenzene and solar cells, applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problem of limited performance improvement of devices
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Embodiment 1
[0020] 1) Use ITO / glass as the substrate, and clean it ultrasonically with cleaning agent, deionized water, acetone, and isopropanol.
[0021] 2) Using SnO with a concentration of 2.5wt.% 2 The electron transport layer was prepared from the solution and spin-coated at 4000rpm for 30s.
[0022] 3) On SnO 2 On the transport layer, a perovskite absorber layer was prepared by a two-step spin-coating method. 1.5M PbI 2 The solution was spin-coated at 1500rpm for 30s and annealed at 70°C. Then in PbI 2 The organic salt solution was added dropwise on the surface of the layer, spin-coated at 2000rpm for 30s and annealed at 150°C to obtain a perovskite film.
[0023]4) Prepare a p-methoxyphenylacetic acid passivation layer on the perovskite absorber layer. The solubility of p-methoxyphenylacetic acid solution is 3mg / ml, the solvent is chlorobenzene, and it is spin-coated at 5000rpm for 30s.
[0024] 5) Prepare a Spiro-OMeTAD hole transport layer on the passivation layer, and spi...
Embodiment 2
[0031] 1) Use ITO / glass as the substrate, and clean it ultrasonically with cleaning agent, deionized water, acetone, and isopropanol.
[0032] 2) Using SnO with a concentration of 2.5wt.% 2 The electron transport layer was prepared from the solution and spin-coated at 4000rpm for 30s.
[0033] 3) On SnO 2 On the transport layer, a perovskite absorber layer was prepared by a two-step spin-coating method. 1.5M PbI 2 The solution was spin-coated at 1500rpm for 30s and annealed at 70°C. Then in PbI 2 The organic salt solution was added dropwise on the surface of the layer, spin-coated at 2000rpm for 30s and annealed at 150°C to obtain a perovskite film.
[0034] 4) Anisole passivation layer was prepared on the perovskite absorber layer. Anisole was diluted in chlorobenzene at a concentration of 3 mg / ml and spin-coated at 5000 rpm for 30 s.
[0035] 5) Prepare a Spiro-OMeTAD hole transport layer on the passivation layer, and spin-coat the Spiro-OMeTAD solution at 4000rpm for...
Embodiment 3
[0038] 1) Use ITO / glass as the substrate, and clean it ultrasonically with cleaning agent, deionized water, acetone, and isopropanol.
[0039] 2) Using SnO with a concentration of 2.5wt.% 2 The electron transport layer was prepared from the solution and spin-coated at 4000rpm for 30s.
[0040] 3) On SnO 2 On the transport layer, a perovskite absorber layer was prepared by a two-step spin-coating method. 1.5M PbI 2 The solution was spin-coated at 1500rpm for 30s and annealed at 70°C. Then in PbI 2 The organic salt solution was added dropwise on the surface of the layer, spin-coated at 2000rpm for 30s and annealed at 150°C to obtain a perovskite film.
[0041] 4) Prepare a phenylacetic acid passivation layer on the perovskite absorber layer. The solubility of the phenylacetic acid solution is 3mg / ml, the solvent is chlorobenzene, and it is spin-coated at 5000rpm for 30s.
[0042] 5) Prepare a Spiro-OMeTAD hole transport layer on the passivation layer, and spin-coat the Sp...
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