Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Annealing method for improving white points of crystalline silicon double-sided battery

A double-sided cell and annealing technology, applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problems of limited effect, change of phosphorus source distribution, and low gas flow, so as to reduce the proportion of white spots, reduce the time used, The effect of improving productivity

Active Publication Date: 2021-02-19
HENGDIAN GRP DMEGC MAGNETICS CO LTD
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method uses variable temperature and variable pressure to reduce PE white spots, but there are the following problems: 1) In this method, the temperature in the furnace tube is raised to 850-980° C. in step (3). If the temperature is too high, most impurities will enter the silicon wafer. It cannot be effectively eliminated, but instead increases the defect rate of EL; and the high temperature state greatly changes the distribution of phosphorus sources, which seriously affects the electrical properties of the silicon wafer; The pressure is controlled at 100-300mbar, the pressure is too low, the gas flow rate is too small, resulting in limited "purging" effect, and the reduction of white spots is limited; 3) The process of this method is too long in the process of heating and cooling, which seriously affects the production capacity
In this method, the temperature rise oxidation is performed first, and then the operation of purging and vacuuming is carried out, which will result in more impurities and seriously affect the electrical properties of the cell.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Annealing method for improving white points of crystalline silicon double-sided battery
  • Annealing method for improving white points of crystalline silicon double-sided battery
  • Annealing method for improving white points of crystalline silicon double-sided battery

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0082] This embodiment provides an annealing method for improving the white point of a crystalline silicon double-sided battery. The process flow chart of the annealing method is as follows figure 1 shown.

[0083] Described annealing method comprises the following steps:

[0084] (1) Entering the boat: Insert the silicon wafer after alkali polishing into the quartz boat and send it into the furnace tube. During the boat entering process, 2500 sccm of nitrogen gas is introduced, and the boat entering time is 450s;

[0085] (2) One-time vacuuming: use a vacuum pump to vacuumize for 200s, heat up to 580°C during the vacuuming process, and the pressure in the furnace tube after vacuuming is 75mbar;

[0086](3) Purge: Use nitrogen to purge for 250s, the flow rate of the nitrogen is 16SLM, close the gas outlet pipe and heat up to 625°C during the purge process, after purge, the pressure in the furnace tube rises to 750mbar;

[0087] (4) Secondary vacuuming: use a vacuum pump to v...

Embodiment 2

[0093] This embodiment provides an annealing method for improving the white point of a crystalline silicon double-sided battery, and the annealing method includes the following steps:

[0094] (1) Entering the boat: Insert the silicon wafer after alkali polishing into the quartz boat and send it into the furnace tube. During the boat entering process, 1000 sccm of nitrogen gas is introduced, and the boat entering time is 300s;

[0095] (2) One-time vacuuming: use a vacuum pump to evacuate for 150s, heat up to 550°C during the vacuuming process, and the pressure in the furnace tube after vacuuming is 50mbar;

[0096] (3) Purge: Use nitrogen to purge for 200s, the flow rate of the nitrogen is 11SLM, close the outlet pipe during the purge and heat up to 600°C, after purge, the pressure in the furnace tube rises to 700mbar;

[0097] (4) Secondary evacuation: Use a vacuum pump to evacuate for 150s. After evacuating, the pressure in the furnace tube is 100mbar. During the vacuuming ...

Embodiment 3

[0103] This embodiment provides an annealing method for improving the white point of a crystalline silicon double-sided battery, and the annealing method includes the following steps:

[0104] (1) Entering the boat: Insert the silicon wafer after alkali polishing into the quartz boat and send it into the furnace tube. During the boat entering process, 4000 sccm of nitrogen gas is introduced, and the boat entering time is 600s;

[0105] (2) One-time vacuuming: use a vacuum pump to evacuate for 250s, heat up to 600°C during the vacuuming process, and the pressure in the furnace tube after vacuuming is 100mbar;

[0106] (3) Purge: Use nitrogen to purge for 300s, the flow rate of the nitrogen is 20SLM, close the outlet pipe during the purge and heat up to 650°C, after purge, the pressure in the furnace tube rises to 800mbar;

[0107] (4) Secondary vacuuming: use a vacuum pump to vacuumize for 250s. After vacuuming, the pressure in the furnace tube is 200mbar. During the vacuuming ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an annealing method for improving white points of a crystalline silicon double-sided battery. The annealing method comprises the following steps of (1) feeding into a boat; (2)vacuumizing for the first time; (3) purging; (4) vacuumizing for the second time; (5) heating and oxidizing; (6) carrying out constant-temperature oxidation; (7) returning pressure; (8) discharging from the boat, wherein the stage from primary vacuumizing in the step (2) to constant-temperature oxidation in the step (6) is a continuous heating stage. According to the annealing method, an annealingprocess is optimized, the whole process is in the continuous heating stage from the step (2) to the step (6), heating and then cooling are not needed, the process time is saved, and the productivityis improved; meanwhile, the white dot proportion of the double-sided battery is obviously reduced, the industrial large-scale production is facilitated, and the annealing method has better industrialapplication prospect.

Description

technical field [0001] The invention belongs to the technical field of crystalline silicon solar cells, and in particular relates to an annealing method for improving white spots of crystalline silicon double-sided cells. Background technique [0002] In recent years, with the development of crystalline silicon cell technology, bifacial solar cells have begun to replace single-sided solar cells and gradually become mainstream products in the market because they can also generate electricity on the back side, which can greatly reduce costs. Both double-sided batteries and single-sided batteries have to undergo thermal oxidation treatment during the preparation process. The difference is that the back of the single-sided battery is covered by the aluminum back field, even if there are small white spots on the back, it will be completely covered by the aluminum back field, so There will be no defects in appearance; when producing double-sided batteries, the back of the battery ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCH01L31/1864H01L31/1804Y02P70/50
Inventor 张逸凡何悦李文龙朱太英金杭
Owner HENGDIAN GRP DMEGC MAGNETICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products