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Mask for photovoltaic cell and preparation method of mask

A technology of photovoltaic cells and manufacturing methods, which is applied in the manufacture of circuits, electrical components, and final products, can solve the problems of high cost, complicated photolithography technology, and difficulty in meeting the accuracy requirements of patterned masks, so as to simplify the process and reduce the cost. cost effect

Pending Publication Date: 2020-11-24
SUZHOU SUNWELL NEW ENERGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is difficult to meet the precision requirements for screen-printed patterned masks, and photolithography is complex and expensive

Method used

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  • Mask for photovoltaic cell and preparation method of mask
  • Mask for photovoltaic cell and preparation method of mask
  • Mask for photovoltaic cell and preparation method of mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] see figure 1 , making a patterned mask on the two surfaces of the semi-finished solar cell 11, the specific method steps are:

[0021] S11. Heat the wax whose melting temperature is between 40-150° C. to melt, and first print a layer of wax on the corresponding areas of the two surfaces of the solar cell by inkjet printing to form a patterned mask 12;

[0022] S12 , printing more wax at the opening edge position 13 of the patterned mask 12 to thicken it, so as to meet the height of the opening edge of the patterned mask, and save materials and process time. In some other embodiments, colorants or dyes are added to the wax to make it have a specific color, but ensure that the average photon transmittance of the mask is greater than 10 in the UV-VIS-NIR (ultraviolet-visible-near infrared) range. %.

[0023] S13 , depositing copper metal 14 in the opening area of ​​the patterned mask by using an electroplating method, and then depositing tin metal 15 by using an electrol...

Embodiment 2

[0025] see figure 2 , making a patterned mask on the emitter surface of the semi-finished solar cell 21, the specific method steps are:

[0026] S21, heating the wax with a melting temperature between 40-150° C. to melt, and then printing a single layer or multiple layers of wax on the corresponding area of ​​the surface of the solar cell by inkjet printing to form a patterned mask 22;

[0027] S22 , perform heavy doping on the solar cell in the opening region 23 of the patterned mask 22 , and then form metal grid lines 24 by sputtering metal in the mask opening above the heavily doped region.

[0028] S23. Finally, the solar cell is heated to a temperature above the melting temperature of the wax to melt it, and then the whole or part of the wax is removed from the solar cell by air flow or water flow. In some other embodiments, the wax forming the patterned mask is soluble in a specific acid, alkali or organic solvent, and can be removed with a corresponding acid, alkali o...

Embodiment 3

[0030] see image 3 , making a patterned mask on the surface of the semi-finished solar cell 31, the specific method steps are:

[0031] S31 , making positive electrode metal contact 32 on the surface of one end of semi-finished solar cell 31 by electroplating, screen printing, vacuum coating and other methods.

[0032] S32. Heat the wax with a melting temperature between 40-150°C until it melts, and then print a single layer or multiple layers of wax on the corresponding area of ​​the solar cell by inkjet printing to form a patterned mask 33, the patterned mask The film 33 is insulating and has an average photon transmittance greater than 90% in the UV-VIS-NIR (ultraviolet-visible-near infrared) range.

[0033] S33 , etching away the anode metal contact 32 in the opening area 34 of the patterned mask 33 on the solar cell.

[0034] S34 , printing wax on the edge area of ​​the opening of the patterned mask 33 by inkjet printing again, so that the metal contact of the positive...

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Abstract

The invention discloses a mask for a photovoltaic cell. The mask is manufactured on a specific area of the solar cell, the surface of the solar cell in the area is shielded, and the surface of the solar cell in the area which is not shielded is exposed. The mask is made of wax, the melting point of the wax ranges from 40 DEG C to 150 DEG C, and the average photon transmittance of the mask in the UV-VIS-NIR range is larger than 10%. The cost can be reduced, and the process is simplified. More importantly, the mask has certain light transmittance and different colors at the same time. After thesolar cell is manufactured, the mask cannot be removed. The solar cell has certain ornamental value while meeting certain power generation capacity so as to meet more personalized market requirements,and meanwhile, the solar cell can be used as an isolation layer between an adhesive film and the solar cell after a component is packaged so as to prevent heavy metal ions of the adhesive film and / oracid generated by aging of the adhesive film from damaging the surface of the solar cell.

Description

technical field [0001] The invention relates to the field of making solar cells, in particular to a mask for photovoltaic cells and a preparation method thereof. Background technique [0002] Some high-efficiency solar cells, such as IBC cells, HBC cells, etc., need to make patterned masks on their surfaces during their production process to form different polar regions; some low-cost metallization processes such as electroplating copper technology also require The position and size of the metal electrodes are defined on the surface of the solar cell through a patterned mask. However, the screen-printed patterned mask is difficult to meet the precision requirements, and the photolithography technology is complex and expensive. The development of a patterned mask technology with low cost, simple process and no damage to the cell surface will be a key factor to promote the real commercialization of high-efficiency solar cells and low-cost metallization technology. Contents ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L21/027
CPCH01L31/18H01L21/0271Y02P70/50
Inventor 邓晓帆姚宇李中天
Owner SUZHOU SUNWELL NEW ENERGY CO LTD
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