Copper metaaluminate memristor based on flexible substrate and preparation method
A flexible substrate and memristor technology, applied in the direction of electrical components, etc., to achieve the effect of simple preparation process
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Embodiment 1
[0031] This embodiment provides a copper metaaluminate memristor based on a flexible substrate, the memristor has a vertical four-layer structure of an upper electrode 4, a resistive layer 3, a lower electrode 2, and a flexible substrate 1 from top to bottom. The upper electrode 4 of the memristor is a copper film; the resistive layer 3 of the memristor device is a copper metaaluminate film; the lower electrode 2 is a transparent conductive film of indium tin oxide; the flexible substrate of the memristor 1 is polyethylene naphthalate.
[0032] The resistive layer 3 of the memristor is obtained by radio frequency sputtering, and has a thickness of 50nm-300nm.
[0033] The bottom electrode 2 is an indium tin oxide bottom electrode with a thickness of 100-200 nm.
[0034] This embodiment also provides a method for preparing a copper metaaluminate memristor based on a flexible substrate, including the following process steps:
[0035] (1) Prepare polyethylene naphthalate as a f...
Embodiment 2
[0049] This embodiment provides a copper metaaluminate memristor based on a flexible substrate, the memristor has a vertical four-layer structure of an upper electrode 4, a resistive layer 3, a lower electrode 2, and a flexible substrate 1 from top to bottom. The upper electrode 4 of the memristor is a copper film or a silver film; the resistive layer 3 of the memristor is a copper metaaluminate film; the lower electrode 2 is a transparent conductive film of indium tin oxide; the memristor The flexible substrate 1 is polyethylene terephthalate material.
[0050] The resistive layer 3 of the memristor is obtained by radio frequency sputtering, and has a thickness of 50nm-300nm.
[0051] The upper electrode 4 of the memristor is a copper film.
[0052] The bottom electrode 2 is an indium tin oxide bottom electrode with a thickness of 100-200 nm.
[0053] This embodiment also provides a method for preparing a copper metaaluminate memristor based on a flexible substrate, including...
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