Manufacturing method of power semiconductor device and power semiconductor device
A technology of power semiconductors and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve problems such as high flow capacity, low reverse recovery turn-off capacity, and large blocking leakage
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0023] The main structure of the existing reverse-resistance GCT chip in the vertical direction includes four layers of PNPN, such as figure 1 Shown, according to the degree of doping, subdivided into P + Transparent emitter anode 02, P base region 03, N - Base 04, P Base 05, P + Short base 06 and N + Emitter 07 (hereinafter also referred to as cathode comb). In addition, the GCT may also include an anode 01 , a cathode 08 and a gate 09 . There a...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com