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Vacuum coating equipment and vacuum coating method

A technology of vacuum coating and equipment, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problem of low molecular energy, achieve compact structure, optimize mechanical properties, and improve mechanical properties.

Inactive Publication Date: 2020-08-25
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In order to solve the problems of the prior art, the purpose of the present invention is to overcome the deficiencies of the prior art, provide a vacuum coating equipment and vacuum coating method, use the pressure difference to increase the kinetic energy of the coating molecules, and use the optimization of the exhaust path in the vacuum chamber to achieve Improve the mechanical properties of thin films and solve the problem of low molecular energy

Method used

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  • Vacuum coating equipment and vacuum coating method

Examples

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Effect test

Embodiment 1

[0043] In this example, if figure 1 As shown, a vacuum coating equipment includes a coating vacuum chamber 1, an evaporation source 3, a sample stage 5, a heating source 6, and an air extraction system. Output heat, and then control the temperature of the sample stage 5 and the substrate arranged on the sample stage 5; a small vacuum chamber 2 communicated with the coating vacuum chamber 1 is also provided, and the nested combination between the coating vacuum chamber 1 and the small vacuum chamber 2 communicates , the small vacuum chamber 2 is arranged inside the coating vacuum chamber 1; the evaporation source 3 is arranged in the small vacuum chamber 2, and the pumping system includes a mechanical pump 10 and a molecular pump 11, and the mechanical pump 10 is respectively connected with the coating vacuum through the rough pumping valve 12. The chamber 1 is connected with the small vacuum chamber 2, and the molecular pump 11 is respectively connected with the coating vacuu...

Embodiment 2

[0077] This embodiment is basically the same as Embodiment 1, especially in that:

[0078] In this embodiment, a vacuum coating method adopts a vacuum coating device of this embodiment, comprising the following steps:

[0079] a. Clean the substrate:

[0080] Use the pre-cleaned silicon wafer or tungsten carbide plate as the substrate, put it into acetone, ethanol, and deionized water for ultrasonic cleaning for 10 minutes each, and then dry it with nitrogen;

[0081] b. Place the substrate:

[0082] The cleaned substrate is placed and transferred to the coating vacuum chamber 1, and placed on the sample stage 5, and the sample stage 5 is connected to the negative bias power supply;

[0083] c. Load preparation materials:

[0084] Transfer the cleaned sample to the small vacuum chamber 2, put the fullerene powder into the evaporation boat, fix it, and then put it into the small vacuum chamber 2 together;

[0085] d. Vacuum coating:

[0086] Turn on the exhaust system, eva...

Embodiment 3

[0091] This embodiment is basically the same as the previous embodiment, and the special features are:

[0092] In this embodiment, a vacuum coating method adopts a vacuum coating device of this embodiment, comprising the following steps:

[0093] a. Clean the substrate:

[0094] The pre-cleaned sapphire substrate was used as the substrate, ultrasonically cleaned in acetone, ethanol, and deionized water for 10 minutes each, and then dried with nitrogen;

[0095] b. Place the substrate:

[0096] The cleaned substrate is placed and transferred to the coating vacuum chamber 1, and placed on the sample stage 5, and the sample stage 5 is connected to the negative bias power supply;

[0097] c. Load preparation materials:

[0098] Transfer the cleaned sample to the small vacuum chamber 2, put the fullerene powder into the evaporation boat, fix it, and then put it into the small vacuum chamber 2 together;

[0099] d. Vacuum coating:

[0100] Turn on the exhaust system, evacuate ...

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Abstract

The invention discloses vacuum coating equipment and a vacuum coating method. The vacuum coating equipment comprises a coating vacuum chamber, an evaporation source, a sample table, a heating source and an air exhaust system, the vacuum coating equipment is also provided with a small vacuum chamber communicating with the coating vacuum chamber, and the coating molecular or atomic kinetic energy isimproved by utilizing the pressure difference, so that the mechanical property of a thin film is improved. The vacuum coating method comprises the steps of cleaning a substrate, placing a base plate,loading a preparation material, performing vacuumizing coating, and performing annealing. According to the vacuum coating equipment and the vacuum coating method, the pressure difference between thetwo connected vacuum chambers is utilized to provide additional directional kinetic energy for coating molecules, and the combination of a radio frequency power supply and a bias power supply can be utilized to provide assistance in deposition when necessary. A new method for optimizing the mechanical property of the vacuum thin film by improving the hardness of the thin film by adding directionalmolecular or atomic kinetic energy is provided, and the method is expected to provide a new way for improving the mechanical property of the vacuum thin film. The preparation method is simple, easy to operate, low in cost and suitable for popularization and application.

Description

technical field [0001] The invention relates to a film preparation device and a preparation method, in particular to a device and a process for improving mechanical properties such as film hardness, which are applied in the technical field of physical vapor deposition. Background technique [0002] The research of thin films depends on the preparation equipment and technology of thin films. High-quality thin films are conducive to the research of thin film physics and the development of thin film device applications. With the application of laser technology, microwave technology and ion beam technology, people have developed a variety of thin film preparation technologies and methods. [0003] Thin film preparation technology is divided into two categories, the first category is PVD, that is, physical vapor deposition, including vacuum evaporation method, magnetron sputtering method, ion plating and so on. The basic principle of vacuum evaporation is to evaporate metals, me...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/228C23C14/24C23C14/54
Inventor 陈益钢程竞经
Owner SHANGHAI UNIV
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