Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure

A technology of surface treatment device and homogeneous medium, applied in the direction of plasma, electrical components, etc., can solve the problems of unfavorable electrode structure for large-area plate processing, processing material shape, thickness limitation, inability to meet special requirements, etc., to improve the processing effect, The effect of reducing breakdown field strength and high discharge power

Inactive Publication Date: 2020-01-17
SHANGHAI JIAO TONG UNIV
View PDF18 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Zheng Ronghao etc. (CN104955884A) have invented a kind of polytetrafluoroethylene surface hydrophilicity modification method, realized the hydrophilicity of the modified material surface under the atmospheric pressure, but the electrode distance of this invention is relatively close, to the shape of processing material, thickness etc. are limited, which is not conducive to mass production
Guo Hongfei et al. (CN107135597A) announced a device and method for producing large gaps and large-area uniform discharge plasma in atmospheric pressure air. It is beneficial to the processing of large-area plates, and the modified design cannot meet the special requirements of different materials for different gases

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure
  • Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure
  • Large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] refer to figure 1 and 2 , a large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure, in a tempered glass reaction vessel with a wall thickness of 3cm, low-voltage electrodes and high-voltage electrodes covered with a 2mm quartz medium are alternately distributed, and the electrode spacing is 1cm. First, clean the PTFE surface of the material to be treated with ethanol, then place it in the air to dry naturally, then put it into the fixed slot by the airtight door, and then let the air flow in. Finally, turn on the nanosecond pulse power supply, the output voltage is 10kV, the output frequency is 2kHz, and the processing time is 5min.

Embodiment 2

[0046] refer to figure 1 and 2 , a large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure, in a tempered glass reaction vessel with a wall thickness of 3cm, low-voltage electrodes and high-voltage electrodes covered with a 2mm quartz medium are alternately distributed, and the electrode spacing is 1cm. First, use ethanol to clean the surface of the polytetrafluoroethylene of the material to be treated, then place it in the air to dry naturally, then put it into the fixed slot by the airtight door, and then pass it into argon (the argon needs to be pre-ventilated for 30 minutes) exclude air). Finally, turn on the nanosecond pulse power supply, the output voltage is 10kV, the output frequency is 2kHz, and the processing time is 5min.

Embodiment 3

[0048] refer to figure 1 and 2 , a large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure, in a tempered glass reaction vessel with a wall thickness of 3cm, low-voltage electrodes and high-voltage electrodes covered with a 2mm quartz medium are alternately distributed, and the electrode spacing is 1cm. First, use ethanol to clean the PTFE surface of the material to be treated, then place it in the air to dry naturally, then put it into the fixed slot by the airtight door, and then pass it into carbon dioxide (the carbon dioxide gas needs to be pre-ventilated for 30 minutes to get rid of it. Air). Finally, turn on the nanosecond pulse power supply, the output voltage is 10kV, the output frequency is 2kHz, and the processing time is 5min.

[0049] refer to Figure 4 , The atmospheric pressure uniform dielectric barrier discharge of different gases is introduced, which effectively improves the hydrophilicity of the surface of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a large-gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure. The treatment device comprises a closed reaction container, a working electrode arranged in the closed reaction container and a nanosecond pulse power supply (1) connected with the working electrode, wherein the working electrode comprises a plurality of outer-layercovering electrode media (6), low-voltage electrodes (4) and high-voltage electrodes (3), wherein the low-voltage electrodes (4) and the high-voltage electrodes (3) are distributed alternately; a fixing groove (7) used for fixing materials to-be treated is formed between adjacent electrodes; the closed reaction container comprises an air inlet (2) and an air outlet (5), and an S-shaped air flow channel is formed between the air inlet 2 and the air outlet 5. Compared with the prior art, uniform dielectric barrier discharge with the discharge gap larger than 5 mm can be achieved, proper gas canbe introduced in the discharge process, and meanwhile the treatment device has the advantages of being large in discharge gap, large in discharge power, capable of achieving normal-pressure operation, uniform in material surface treatment and the like.

Description

technical field [0001] The invention belongs to the field of atmospheric pressure uniform dielectric barrier discharge plasma and synthesis of new materials, and in particular relates to a large gap uniform dielectric barrier discharge plasma surface treatment device under atmospheric pressure. Background technique [0002] In recent years, with the development of science and technology, materials with special surface properties are more and more widely used in various fields. The surface modification technology is to endow the material with new characteristics under the premise of maintaining the original properties of the material. Existing surface modification technologies include ozone treatment, ultraviolet irradiation, plasma treatment, high-energy radiation, chemical grafting, etc. Among them, plasma treatment is favored due to its advantages of low cost, good effect, and short time. extensive attention. [0003] Common atmospheric pressure plasma discharge types in...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH05H1/2406H05H1/2437
Inventor 潘云翔刘鹏彭行翠
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap