Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-temperature-oxidation-resistant aluminum-chromium-silicon-nitride and alumina multilayer composite coating and preparing method thereof

A technology of high temperature oxidation resistance, aluminum chromium silicon nitrogen, applied in coatings, metal material coating processes, ion implantation plating and other directions, can solve the problems of insufficient wear resistance of coatings, difficult to obtain use effects, low deposition temperature , to achieve the effect of avoiding low hardness, high strength and toughness, and fast deposition rate

Active Publication Date: 2020-01-03
SICHUAN UNIV
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the low deposition temperature of the physical vapor deposition method, the deposition of α-Al by this method 2 o 3 Insufficient energy, Al prepared by physical vapor deposition method 2 o 3 Coatings are usually amorphous or other crystalline structures, making it difficult to obtain ideal results
In addition, Al 2 o 3 The hardness of the coating is lower than that of the nitride coating, and the single Al 2 o 3 The wear resistance of the coating is insufficient, and the coating system with a complex structure is an important development direction of the coating in the future

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Put the clean cermet substrate into the vacuum chamber of the plasma-enhanced compound ion coating system, and when the vacuum of the back is evacuated to 0.02Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and at the same time turn on the rotating power to keep the substrate from Stop rotating and heat until the temperature of the substrate reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.1Pa, and then apply a DC bias voltage of -200V and a pulse bias voltage of -400V to the substrate, Using ionized Ar + Etch the surface of the substrate for 60 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon to ensure that the working pressure is 0.15Pa, turn on the main arc power supply of the evaporation plating for evaporation coating, the main arc current on the crucible is 180A, and evaporate the raw material for Cr 0.2 Al 0.2 Ti 0.2...

Embodiment 2

[0029] Put the clean cemented carbide substrate into the vacuum chamber of the plasma-enhanced compound ion coating system, and when the vacuum of the back is evacuated to 0.03Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and turn on the rotating power supply at the same time to make the substrate Rotate continuously, heat until the substrate temperature reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.25Pa, and then apply a DC bias voltage of -200V and a pulse bias voltage of -350V to the substrate , using the ionized Ar + Etch the surface of the substrate for 30 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon to ensure that the working pressure is 0.2Pa, turn on the main arc power supply of the evaporation plating for evaporation coating, the main arc current on the crucible is 210A, and evaporate the raw material for Cr 0.2 Al...

Embodiment 3

[0031] Put the clean cermet substrate into the vacuum chamber of the plasma-enhanced compound ion coating system, and when the vacuum of the back is evacuated to 0.03Pa, turn on the auxiliary heating device on the furnace wall to heat the substrate, and turn on the rotating power supply at the same time so that the substrate does not Stop rotating and heat until the temperature of the substrate reaches 380°C; then pass argon gas into the vacuum chamber, adjust the flow rate of argon gas to ensure the pressure is 0.15Pa, and then apply a DC bias voltage of -200V and a pulse bias voltage of -400V to the substrate, Using ionized Ar + Etch the surface of the substrate for 90 minutes; turn off the bias voltage of the substrate in turn, adjust the flow of argon to ensure that the working pressure is 0.1Pa, turn on the main arc power supply of the evaporation plating for evaporation coating, the main arc current on the crucible is 220A, and evaporate the raw material for Cr 0.2 Al ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a high-temperature-oxidation-resistant aluminum-chromium silicon nitride and alumina multilayer composite coating which is a whole formed by sub-layers including a CrAlTiZrY high-entropy alloy bonding layer, an alpha-Cr2O3 oxide template layer, an alpha-Al2O3 oxide core layer and an AlCrSiN nitride surface layer which are arranged from inside to outside. The total thicknessof the coating is 1 micron to 3 microns. A preparation method of the coating comprises the steps that after a substrate is heated and is subjected to ion etching, the CrAlTiZrY layer is firstly deposited on the substrate by using an arc evaporation plating process; and then a cathode arc ion plating process is used, and then the alpha-Cr2O3 layer, the alpha-Al2O3 layer and the AlCrSiN layer are sequentially deposited. Due to the anti-oxidation synergistic effect of all sub-coatings, the high-temperature oxidation resistance of the aluminum-chromium-silicon-nitride and alumina multilayer composite coating is further improved, the abrasion resistance of the coating is good, the preparation process is simple, implementation is easy, and the coating is suitable for industrialized production and application.

Description

technical field [0001] The invention belongs to the technical field of cutting tool surface coatings, in particular to a high-temperature oxidation-resistant aluminum chromium silicon nitrogen and aluminum oxide multilayer composite coating and a preparation method thereof. Background technique [0002] With the development and progress of cutting technology and the improvement of cutting requirements, cutting tools, including coating materials on their surfaces, are facing challenges. The new cutting technology represented by dry chips and high-speed cutting is characterized by an increase in the temperature of the cutting area, and a corresponding increase in the temperature of the cutting part of the tool. Therefore, in addition to the failure of the surface wear of the coated tool, the coating also often fails due to oxidation. Nitride hard coating is a widely used coating material on the surface of cutting tools. Nitride coating is easy to interact with oxygen in the ai...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/16C23C14/08C23C14/06C23C14/02
CPCC23C14/022C23C14/025C23C14/0641C23C14/081C23C14/083C23C14/16C23C14/325
Inventor 鲜广赵海波鲜丽君
Owner SICHUAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com