Gallium oxide-based solar blind detector and preparation method thereof
A gallium oxide and photodetector technology, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of large dark current of the detector, non-adjustable, slow device response speed, etc., and increase effective work Interval, repair interface damage, and improve the effect of response speed
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[0043] Preparation of the layer The epitaxial layer can also be prepared by various other deposition or growth methods, including but not limited to methods such as MOCVD or PLD to obtain gallium oxide epitaxial films.
[0044] see figure 2 As shown, photolithographic patterning is used to isolate the device of the sample by reactive ion beam etching; the etching parameters can be: using Cl 2 / Ar gas for etching, where Cl 2 The flow rate was 15 sccm, the Ar flow rate was 5 sccm, the ICP (inductively coupled plasma) power was 400W, and the RF power was 200W.
[0045] see image 3 As shown, using a standard photolithographic lift-off process, the source and drain electrodes are deposited by electron beam evaporation, and the metals used are platinum / titanium / gold, and gallium oxide (Ga 2 o 3) to form a Schottky contact, the electrode thicknesses are 40nm / 10nm / 50nm respectively; the thickness range of platinum is 10-60nm, the thickness range of titanium is 5-20nm, and the th...
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