Method for preparing transition metal-doped alkali silicate glass

An alkali silicate, transition metal technology, applied in coatings and other directions, can solve problems such as energy consumption, failure of doped glass, difficult operation, etc., and achieve the effect of controllability and chemical stability.

Inactive Publication Date: 2019-04-26
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are many problems in doping transition metal ions by electric field assisted ion exchange method: 1. When using electric field assisted doping transition metal ions, high temperature and high voltage are required, which is difficult to operate and consumes a lot of energy; 2. Under the action of electric field, Transition metal ions and ions in the glass matrix migrate and diffuse at the same time, causing the glass matrix to change from an equilibrium state to an unbalanced state. The stronger the electric field, the farther away from the equilibrium state. When encountering high temperature and unfavorable environment, the doped glass is caused by Transition from non-equilibrium state to equilibrium state, doped glass fails

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  • Method for preparing transition metal-doped alkali silicate glass
  • Method for preparing transition metal-doped alkali silicate glass

Examples

Experimental program
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Effect test

Embodiment 1

[0024] (1) Cut commercial soda-lime silicate glass into glass substrates with a size of 100×50×0.7mm, and then perform chamfering, chamfering, polishing, deionized water cleaning and drying, wherein the mass percentage: 72% SiO 2 , 13.5% Na 2 O, 1%K 2 O, 8% CaO, 4% MgO, 1.2% Al 2 o 3 and others.

[0025] (2) Ion exchange treatment: In an automatic tempering furnace, immerse the processed glass substrate in pure potassium nitrate molten salt with a purity greater than or equal to 99.9%, adjust the temperature to 450° C., and perform ion exchange for 8 hours. After K + -Na + The ion-exchanged glass substrates were ultrasonically cleaned with acetone and ethanol solutions, and finally air-dried.

[0026] (3) Doping treatment: put the dried glass substrate into the ZZSX-800F vacuum coating system, such as figure 1 As shown, wherein 1 glass substrate; 2 vacuum pump; 3 electron gun; 4 evaporation source; , heating the glass substrate, passing argon gas into the EH1000 Hall ...

Embodiment 2

[0029] (1) Cut commercial soda-lime silicate glass into glass substrates with a size of 80×40×0.8mm, and then perform chamfering, chamfering, polishing, cleaning and drying with deionized water, wherein the mass percentage: 69% SiO 2 , 15% Na 2 O, 1.14%K 2 O, 6.53% CaO, 5.05% MgO, 1.73% Al 2 o 3 and others.

[0030] (2) Ion exchange treatment: In an automatic tempering furnace, immerse the processed glass substrate in pure potassium nitrate molten salt with a purity greater than or equal to 99.9%, adjust the temperature to 480°C, and perform ion exchange for 20 minutes; after K + -Na + The ion-exchanged glass substrates were ultrasonically cleaned with acetone and ethanol solutions, and finally air-dried.

[0031] (3) Doping treatment: put the dried glass substrate into the CCZK-ION multi-arc ion coating system, add gold particles to be doped with a purity greater than or equal to 99.99% in the plating target, vacuum the vacuum pump, and heat the glass substrate The gla...

Embodiment 3

[0034] (1) Cut commercial soda-lime silicate glass into glass substrates with a size of 100×50×0.8 mm, and then perform chamfering, chamfering, polishing, cleaning and drying with deionized water, 72% SiO 2 , 13.5% Na 2 O, 1%K 2 O, 8% CaO, 4% MgO, 1.2% Al 2 o 3 and others.

[0035] (2) Ion exchange treatment: In an automatic tempering furnace, immerse the processed glass substrate in pure potassium nitrate molten salt with a purity greater than or equal to 99.9%, adjust the temperature to 360°C, and perform ion exchange for 50 hours; after K + -Na + The ion-exchanged glass substrate was ultrasonically cleaned with acetone solution, and finally air-dried.

[0036] (3) Doping treatment: put the dried glass substrate into the FJL560D2 ion beam multi-functional sputtering coating system, add a chromium target with a purity greater than or equal to 99.99% to the sputtering target, vacuum the vacuum pump, and heat the glass substrate. The ion beam sputtering method is used to ...

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Abstract

The invention discloses a method for preparing transition metal-doped alkali silicate glass. The method comprises the following steps: step (1) performing ion-exchange treatment on alkali silicate glass, and then cooling, washing and drying; and step (2) placing the dried alkali silicate glass in a vacuum coating system, depositing transition metal on the surface of the alkali silicate glass by aphysical vapor deposition method to realize the doping of the transition metal to the alkali silicate glass, wherein the doping depth is regulated and controlled by ion exchange temperature and time,different physical vapor deposition methods and deposition parameters. The method can rapidly, efficiently and controllably realize the doping of the transition metal to the alkali silicate glass.

Description

technical field [0001] The invention relates to a method for preparing glass doping, in particular to a method for preparing alkali silicate glass doped with transition metals. Background technique [0002] With the rapid development of the communication industry, the demand for high transmission rate and broadband components in the communication field is also increasing. As a high-quality optical material, glass has the remarkable characteristics of high uniformity, light transmission and low cost. It is not only the preferred material in traditional optical system design, but also an important matrix material in integrated optics. Silicate glasses doped with transition metals have unique optical properties and are widely used in optoelectronic fields such as passive or active optical waveguide devices and laser systems in the communication industry. [0003] Practice has proved that ion exchange is the most effective general-purpose technology to control the refractive in...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C21/00C03C17/09
CPCC03C17/09C03C21/002C03C2218/151
Inventor 张文杰赵志敏庄笑刘振鲁季仁东
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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