Preparation method of sulfonate type photocurable waterborne polyurethane
A water-based polyurethane, sulfonate type technology, applied in the field of coatings and adhesives, can solve the problems of not meeting the development requirements of green chemistry, large solvent consumption, and high difficulty in operation, achieve good hydrophilicity and photocurability, and improve hydrophilicity. , Excellent scratch resistance
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Embodiment 1
[0080] Raw materials used are calculated as follows by weight ratio:
[0081] Photosensitive macromonomer part:
[0082] Glycidyl methacrylate (GMA) 67.32
[0083] Glutaric acid 31.27
[0084] Catalyst 0.71
[0085] Inhibitor 0.70.
[0086] Sulfonate type photocurable waterborne polyurethane part:
[0087] Photosensitive macromonomer 2.10
[0088] Polycaprolactone diol 13.99
[0089] 1,4-Cyclohexanedimethanol 1.81
[0090] Dimethylolbutyric acid 0.62
[0091] BY3306 4.10
[0092] Isophorone diisocyanate 12.75
[0093] Triethylamine 0.40
[0094] Acetone 17.47
[0095] Ethylenediamine 0.26
[0096] Di-n-butyltin dilaurate 0.10
[0097] Deionized water 46.40.
[0098] 1) Add glutaric acid, catalyst, and polymerization inhibitor to the reactor, raise the temperature to 120°C, add glycidyl methacrylate (GMA) dropwise, and keep warm until the end of the theoretical acid value to synthesize a photosensitive macromonomer.
[0099] 2) Add photosensitive macromonomer, po...
Embodiment 2
[0107] The raw materials used are calculated in parts by weight as
[0108] Photosensitive monomer part:
[0109] Glycidyl methacrylate (GMA) 33.40
[0110] Dimer acid 64.25
[0111] Catalyst 1.17
[0112] Inhibitors 1.18.
[0113] Sulfonate type photocurable waterborne polyurethane part:
[0114] Photosensitive monomer 8.15
[0115] Polypropylene carbonate diol 5.51
[0116] Trimethylolpropane 1.96
[0117] Dimethylolpropionic acid 0.67
[0118] Sodium 1,4-butanediol-2-sulfonate 3.44
[0119] Toluene diisocyanate 9.83
[0120] Triethylamine 0.45
[0121] Acetone 23.64
[0122] Ethylenediamine 0.60
[0123] Di-n-butyltin dilaurate 0.15
[0124] Deionized water 45.60.
[0125] 1) Add dimer acid, catalyst, and polymerization inhibitor to the reactor, raise the temperature to 120°C, add glycidyl methacrylate (GMA) dropwise, and keep warm until the end of the theoretical acid value to synthesize a photosensitive macromonomer.
[0126] 2) Add photosensitive macromono...
Embodiment 3
[0134] Wherein, the raw materials used are counted as
[0135] Photosensitive macromonomer part:
[0136] Glycidyl methacrylate (GMA) 58.80
[0137] Azelaic acid 38.92
[0138] Catalyst 1.14
[0139] Inhibitors 1.14.
[0140] Sulfonate type light curing waterborne polyurethane part:
[0141] Photosensitive macromonomer 4.47
[0142] Poly(Neopentyl Glycol Adipate) 8.26
[0143] 1,4-Cyclohexanedimethanol 1.94
[0144] Dimethylolbutyric acid 0.66
[0145] Sodium 1,4-butanediol-2-sulfonate 6.94
[0146] Isophorone diisocyanate 13.64
[0147] Triethylamine 0.45
[0148] Acetone 16.04
[0149] m-Xylylenediamine 0.80
[0150] Di-n-butyltin dilaurate 0.10
[0151] Deionized water 46.70.
[0152] 1) Add azelaic acid, catalyst, and polymerization inhibitor into the reactor, raise the temperature to 120°C, add glycidyl methacrylate (GMA) dropwise, and keep warm until the end of the theoretical acid value to synthesize a photosensitive macromonomer.
[0153] 2) Photosensitive...
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