Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of calcium silicate hydrate nano film

A hydrated calcium silicate, nano-film technology, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of lack of microscopic analysis of macroscopic properties, complex structure, etc., and achieve a universal method. The effect of good performance and simple preparation process

Active Publication Date: 2020-01-07
WUHAN UNIV
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the complex structure of C-S-H materials, there are relatively few studies on its microstructure. Over the years, the microscopic studies of C-S-H can only be limited to first-principle and molecular dynamics calculation simulations.
At present, there are few reports on the test methods for revealing the microstructure and properties of C-S-H, and the performance of macroscopic properties also lacks the support of analysis at the micro level. Therefore, the preparation of micro-scale C-S-H will play a role in promoting the research of this material.
At present, there is no relevant report on the application of magnetron sputtering method to the thin film preparation of cement-based materials.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of calcium silicate hydrate nano film
  • Preparation method of calcium silicate hydrate nano film
  • Preparation method of calcium silicate hydrate nano film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0031] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 0.5;

[0032] (2) Calcining the synthesized calcium silicate hydrate powder at 150° C. for 2 hours, and cooling to room temperature;

[0033] (3) Press the calcined powder with a pressure of 100 MPa to obtain a target with a diameter of 60 mm and a thickness of 4 mm;

[0034] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as the substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to 2cm;

[0035] (5) Vacuum the coating chamber and control the vacuum degree to 5×10 -4 Pa;

[0036] (6) feed argon into the coating chamber, control the flow rate of the inert gas to be 10sccm, and control the...

Embodiment 2

[0041] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0042] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 1.5;

[0043] (2) Calcining the synthesized calcium silicate hydrate powder at 175°C for 2.5h, and cooling to room temperature;

[0044] (3) Press the calcined powder with a pressure of 200 MPa to obtain a target with a diameter of 60 mm and a thickness of 5 mm;

[0045] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as the substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to be 4cm;

[0046] (5) Vacuum the coating chamber and control the vacuum degree to 5×10 -4 Pa;

[0047] (6) feed argon into the coating chamber, control the flow rate of the inert gas to be 20sccm, and control the c...

Embodiment 3

[0052] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0053] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 2.0;

[0054] (2) Calcining the synthesized calcium silicate hydrate powder at 200°C for 2.5h, and cooling to room temperature;

[0055] (3) Press the calcined powder with a pressure of 150 MPa to obtain a target with a diameter of 60 mm and a thickness of 5 mm;

[0056] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as the substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to be 5cm;

[0057] (5) Vacuum the coating chamber and control the vacuum degree to 1.0×10 -3 Pa;

[0058] (6) feed krypton gas into the coating chamber, control the flow rate of the inert gas to be 50sccm, and contr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for preparing a calcium silicate hydrate nano film, which is a method for preparing a calcium silicate hydrate (C-S-H) nano film by using a magnetron sputtering method. Calcium silicate hydrate powder is calcined, and then the calcined powder is pressed into a target with a steel mold, and then a film of a certain thickness is deposited on the surface of the substrate by magnetron sputtering technology, and finally the film sample is placed in calcium hydroxide saturated Soak in the aqueous solution to get the nano film of calcium silicate hydrate. The invention lays a foundation for the observation of the microscopic morphology of the calcium silicate hydrate on the microscopic scale, the research on the mechanical properties, the durability and the like.

Description

technical field [0001] The invention belongs to the technical field of inorganic materials, and in particular relates to a preparation method of a calcium silicate hydrate nano film. [0002] technical background [0003] Cement is the most widely used building material in the world. In the past ten years, the annual output of cement in the world has been more than 3 billion tons, and it has become an important material supporting the development of human civilization; for a long time to come, cement will still be used as the main building material in various engineering fields. Calcium silicate hydrate (C-S-H for short) is the main hydration product of cement, accounting for 50-70% of the total product mass, is the main source of material strength, and is also the main factor affecting the durability of cement building structures, so C-S-H has an important role research value. [0004] The previous C-S-H research mainly focused on the macro or meso scale. Since the damage ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/54C23C14/06
CPCC23C14/06C23C14/35C23C14/542C23C14/3414C23C14/5846C23C14/10B82Y40/00B22F2201/12B22F2202/05B22F2302/45B82Y30/00C23C14/082H01J37/3405H01J2237/332
Inventor 汤盛文阿湖宝余文志周伟陈敬涛何真
Owner WUHAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com