Preparation process for artificial diamond sintered body
A kind of synthetic diamond and diamond technology, applied in metal processing equipment, coating, transportation and packaging, etc., can solve the problems of single component, reduce the overall hardness and wear ratio of sintered body, and the loss of sintered body hardness, so as to improve the production efficiency , shorten the preparation time, and facilitate demoulding
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Embodiment 1
[0040] Embodiment 1: prepare diamond sintered compact according to the following method:
[0041] (1) Sieve the diamond micropowder into three specifications of 10 μm, 20 μm, and 40 μm. After mixing in a weight ratio of 1:2:1, place 6 g of diamond micropowder in 4M NaOH and 1M HCl solutions and boil for 10 minutes respectively. Wash with distilled water until neutral, dry for later use;
[0042] (2) Mix gaseous methane silicon with a purity of 99.5% and germane at a molar ratio of 19:1 at room temperature, and fill it into a chemical vapor deposition equipment with a vacuum of 10Pa, so that the deposition pressure is 300Pa, and the deposition reaction temperature is 600°C. The deposition time is 1h, and the chemical vapor deposition is carried out on the surface of the artificial diamond powder to form a Ge layer with a thickness of 0.5-5 nanometers. 0.05 Si 0.95 The germanium-silicon alloy film, the mass fraction of the germanium-silicon alloy in the diamond-coated micropow...
Embodiment 2
[0047] Embodiment 2: prepare diamond sintered compact according to the following method:
[0048] (1) Sieve the diamond micropowder into three specifications of 20 μm, 30 μm, and 40 μm. After mixing according to the weight ratio of 1:2:1, place 8 g of diamond micropowder in sequence in 4M NaOH and 1M HCl solutions and boil for 20 minutes respectively. Wash with distilled water until neutral, dry for later use;
[0049] (2) Mix gaseous methane silicon with a purity of 99.99% and germane at a molar ratio of 19:1 at room temperature, and fill it into a chemical vapor deposition equipment with a vacuum of 10Pa, so that the deposition pressure is 600Pa, and the deposition reaction temperature is 800°C. The deposition time is 5 hours, and the chemical vapor deposition is carried out on the surface of the artificial diamond powder to form a Ge layer with a thickness of 10-25 nanometers. 0.05 Si 0.95 The germanium-silicon alloy film, the mass fraction of the germanium-silicon alloy ...
Embodiment 3
[0054] Embodiment 3: prepare diamond sintered compact according to the following method:
[0055] (1) Sieve the diamond micropowder into three specifications of 10 μm, 20 μm, and 30 μm, mix them according to the weight ratio of 1:2:1, place 5 g of diamond micropowder in 4M NaOH and 1M HCl solutions and boil them for 15 minutes respectively, Wash with distilled water until neutral, dry for later use;
[0056] (2) Mix gaseous methane silicon with a purity of 99.7% and germane at a molar ratio of 19:1 at room temperature, and fill it into a chemical vapor deposition equipment with a vacuum of 10Pa, so that the deposition pressure is 450Pa, and the deposition reaction temperature is 700°C. The deposition time is 3 hours, and the chemical vapor deposition is carried out on the surface of the artificial diamond powder to form a Ge layer with a thickness of 5-10 nanometers. 0.05 Si 0.95 The germanium-silicon alloy film, the mass fraction of the germanium-silicon alloy in the diamon...
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