Three-layer film structure coating layer and fabrication method thereof
A three-layer film and coating technology, which is applied in the coating, metal material coating process, ion implantation plating, etc., can solve the problem of large internal stress of the coating, poor film/substrate bonding force, coating and substrate bonding force Poor and other problems, to achieve good high temperature oxidation resistance, prevent diffusion adhesion wear, good high temperature thermal stability
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Embodiment 1
[0024] In this example, a three-layer film structure coating is deposited on the surface of high-speed steel:
[0025] (1) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, and after conventional quenching + 560°C (3 times) tempering, the hardness of the substrate is HRC60, grind and polish the coating surface, and place it in anhydrous alcohol solution Ultrasonic cleaning for 15 minutes to remove oil, dried and placed on the sample stage, adjust the distance between the sample and the target to 80mm;
[0026] (2) Select CrAl (50wt.%) and Al+α-Al 2 o 3 (15wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;
[0027] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttle valve unti...
Embodiment 2
[0035] In this embodiment, a three-layer film structure coating is deposited on 3Cr2W8V hot work die steel:
[0036] (1) Choose 3Cr2W8V hot work die steel as the substrate, cut it into Φ10×5mm size, and temper it through conventional quenching + 600°C (3 times), the hardness of the substrate is HRC52, grind and polish the coating surface, and place it in anhydrous Ultrasonic cleaning in alcohol solution for 15 minutes to remove oil, after drying, place it on the sample stage, and adjust the distance between the sample and the target to 80mm;
[0037] (2) Select CrAl (40wt.%) and Al+α-Al 2 o 3 (12wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;
[0038] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttl...
Embodiment 3
[0045] In this embodiment, a three-layer film structure coating is deposited on the surface of the GH2036 superalloy:
[0046] (1) Choose GH2036 high-temperature alloy as the substrate, cut it into Φ10×5mm size, and after solid solution +670℃ aging, the hardness of the substrate is HRC40, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove the oil, put it on the sample stage after drying, and adjust the distance between the sample and the target to 60mm;
[0047] (2) Select CrAl (35wt.%) and Al+α-Al 2 o 3 (10wt.%) as a sputtering target, respectively installed in the corresponding target stations of DC and RF magnetron sputtering;
[0048] (3) After pre-pumping the background vacuum to 10-20Pa, turn on the vacuum heating and baking system, set the baking temperature at 150°C, and then pump to the background vacuum of 6×10 -4 Pa, fill the vacuum chamber with Ar gas and adjust the throttle valve until the vac...
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