A light guide plate production and processing technology and its coating and exposure equipment

Abstract

The invention discloses a guiding plate production and processing technology and a coating exposure device thereof. The coating exposure device comprises a transfer table, a coating machine and an exposure machine. The coating machine is located on one side of the exposure machine, the transfer table sequentially penetrates through the coating machine and the exposure machine, and an ultraviolet source generator is arranged at the top of the exposure machine. An exposure cavity is formed in the middle of the exposure machine, and a rotary exposure device is arranged in the exposure cavity andis connected to the ultraviolet source generator through a light source transmitter. The lower surface of the transfer table is installed on a first base cross beam and a second base cross beam, and the first base cross beam is arranged on a coating shockproof base under the coating machine. The second base cross beam is arranged on the coating shockproof base under the exposure machine. The guiding plate production and processing technology has the advantages that an optical mask plate is not needed, the processing speed is high, the processing efficiency is high, the processing size is large, and the processing compatibility is strong.

Description

technical field [0001] The invention relates to a light guide plate production and processing technology and coating exposure equipment thereof, in particular to a light guide plate production and processing that does not require a mask for exposure, has high processing speed, high processing efficiency, large processing size, and strong processing compatibility. Technology and its coating exposure equipment. Background technique [0002] The photolithography processing method of the dots of the light guide plate includes: laser dot processing, ink dot processing, hot press dot processing, ink dot processing, coating the ink on the processing surface of the light guide plate, and then exposing the ink on the processing surface of the light guide plate through an exposure machine . [0003] The dot lithography process of the light guide plate requires the use of coating and exposure, which belong to two processes and equipment, and the processing section is long; uncertain f...

AI Technical Summary

Problems solved by technology

For surface exposure, it is more difficult to use upper exposure than lower exposure. The upper exposure mask is on the top of the coating layer. It is necessary to ensure the distance between the coating layer and the mask. The coating layer cannot touch the mask, and the spacing should not exceed Large, the graphics accuracy is not high when the spacing is too large

In the upper exposure method, the mask is easily polluted due to the volatilization of the solvent during the exposure process, the cleaning times of the mask increase, and the scrap rate of the mask is high

The single-point exposure machine uses the lens to focus light and process the graphics through point-line exposure according to the drawn graphics. This exposure method does not require a mask, and can also perform upper exposure, but this method is mainly used in small sizes, generally 10 inches. The following; because this kind of exposure is single-point linear processing, the processing speed is very slow, so the size limitation and processing speed of this exposure machine are limited

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