Air-sensitive sensing film for detecting low-concentration nitric oxide and preparation method

A nitrogen oxide and gas sensing technology, applied in measurement devices, instruments, material analysis by electromagnetic means, etc., can solve the problems of high working temperature, low applicable value, low selectivity of SAW devices, etc. Good performance, improved sensitivity and detection quality, and improved electron transfer efficiency

Inactive Publication Date: 2018-11-13
CHENDU NEW KELI CHEM SCI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, copper phthalocyanine thin films show sensitivity to nitrogen oxides. Phthalocyanine materials are mainly used to detect NO. 2 , SAW devices made of copper phthalocyanine (CuPc) as a sensitive thin film material have low selectivity, high operating temperature, and low applicable value

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] (1) Cleaning and drying the porous alumina substrate: the porous alumina substrate with a thickness of 300 μm, a pore diameter of 0.5 μm, and a porosity of 25% was ultrasonically cleaned in absolute ethanol for 15 minutes, deionized water for 15 minutes, and then sent to vacuum Drying in the furnace, the drying temperature is 100°C, and the drying time is 30 minutes;

[0033] (2) Preparation of porous tungsten oxide film: rub the porous alumina substrate obtained in step (1) in calcium sulfate hemihydrate whiskers to make the whiskers adhere to the porous alumina, blow off excess adhered whiskers, and place In the vacuum chamber of the ultra-vacuum target magnetron sputtering equipment, the vacuum degree is 5.3×10 -4 Pa, using metal tungsten with a mass purity of 99.96% as the target material, argon with a mass purity of 99.999% as the working gas, the flow rate of argon gas at 24ml / min, and oxygen with a mass purity of 99.99% as the reaction gas, sputtering The workin...

Embodiment 2

[0036] (1) Cleaning and drying the porous alumina substrate: the porous alumina substrate with a thickness of 300 μm, a pore diameter of 0.5 μm, and a porosity of 25% was ultrasonically cleaned in absolute ethanol for 15 minutes, deionized water for 15 minutes, and then sent to vacuum Drying in the furnace, the drying temperature is 100°C, and the drying time is 30 minutes;

[0037] (2) Preparation of porous tungsten oxide film: rub the porous alumina substrate obtained in step (1) on calcium sulfate hemihydrate whiskers to make the whiskers adhere to the porous alumina, blow off excess adhered whiskers, and place The vacuum chamber of the ultra-vacuum target magnetron sputtering equipment, the vacuum degree is 1.0×10 -4 Pa, using metal tungsten with a mass purity of 99.97% as the target material, argon with a mass purity of 99.9995% as the working gas, argon flow rate of 24ml / min, and oxygen with a mass purity of 99.99% as the reaction gas, sputtering The working pressure is...

Embodiment 3

[0040] (1) Cleaning and drying the porous alumina substrate: the porous alumina substrate with a thickness of 200 μm, a pore diameter of 0.9 μm, and a porosity of 27% was ultrasonically cleaned in anhydrous ethanol for 20 minutes, deionized water for 15 minutes, and then sent to vacuum Drying in the furnace, the drying temperature is 100°C, and the drying time is 30 minutes;

[0041] (2) Preparation of porous tungsten oxide film: rub the porous alumina substrate obtained in step (1) in calcium sulfate hemihydrate whiskers to make the whiskers adhere to the porous alumina, blow off excess adhered whiskers, and place In the vacuum chamber of the ultra-vacuum target magnetron sputtering equipment, the vacuum degree is 1.5×10 -4 Pa, using metal tungsten with a mass purity of 99.97% as the target material, argon with a mass purity of 99.999% as the working gas, the flow rate of the argon gas at 24ml / min, and oxygen with a mass purity of 99.999% as the reaction gas, sputtering The ...

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Abstract

The invention relates to the field of high-performance air-sensitive materials, in particular to an air-sensitive sensing film for detecting low-concentration nitric oxide and a preparation method. The preparation method of the air-sensitive sensing film for detecting low-concentration nitric oxide comprises the following steps that a cleaned and dried porous aluminum oxide substrate is rubbed, calcium sulfate crystal whiskers are attached to the substrate, then the substrate is put in a vacuum chamber of an ultrahigh-vacuum toward-target magnetron sputtering device, and porous tungsten oxidefilm precipitates on the porous aluminum oxide substrate through sputtering; the obtained porous tungsten oxide film is immersed in a dispersing solution of copper phthalocyanine, N,N-dimethyl formamide and polyurethane, and the copper phthalocyanine / porous tungsten oxide compounded film using the porous aluminum oxide as the substrate is obtained through vacuum drying. The prepared copper phthalocyanine / porous tungsten oxide compounded air-sensitive sensing film has large active specific surface area, and the effect on the aspects such as selectivity, sensitivity and detection quality is remarkably improved during low-concentration nitric oxide detection.

Description

technical field [0001] The invention relates to the field of high-performance gas-sensing materials, in particular to a gas-sensing film for detecting low-concentration nitrogen oxides and a preparation method thereof. Background technique [0002] As environmental protection has received increasing attention, gas sensors have been widely studied as an effective way to monitor the atmosphere in various environments. A gas sensor is a device or device that can sense a certain gas and concentration in the environment, and convert the relevant information of the gas type and concentration into an electrical signal to achieve monitoring, analysis, detection, and alarm. In recent years, gas sensors have been widely used in a series of major demand fields such as food safety (deterioration and bacterial contamination of food), process control (food, pharmaceutical production), clinical diagnosis (human respiratory atmosphere monitoring and excrement odor detection), and are One o...

Claims

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Application Information

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IPC IPC(8): G01N27/12
CPCG01N27/126
Inventor 陈庆司文彬
Owner CHENDU NEW KELI CHEM SCI CO LTD
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