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Preparation method for aluminum-scandium alloy target materials

An alloy target and aluminum scandium technology, which is applied in the field of metal and alloy target processing and preparation, can solve problems such as use limitations, and achieve the effects of low production cost, high relative density, and satisfying performance improvement.

Inactive Publication Date: 2018-08-24
CHANGSHA XUNYANG NEW MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the prior art, a method for preparing an aluminum-scandium master alloy by the aluminothermic reduction method is disclosed, and it is also disclosed that the use of the existing three-layer liquid aluminum refining electrolytic cell, adding scandium chloride or scandium fluoride in the electrolyte, and electrolytic production of high-purity aluminum scandium Alloy method; at the same time, it also discloses an aluminum-scandium rotating target and its preparation method, which uses an arc spraying method to spray the alloy bottom layer, and uses a controlled atmosphere cold spraying method to spray aluminum-scandium powder on the stainless steel substrate containing the alloy primer layer Preparation of rotating target, its thickness is only 3-15mm, the density is 97%, the use is also limited

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  • Preparation method for aluminum-scandium alloy target materials
  • Preparation method for aluminum-scandium alloy target materials
  • Preparation method for aluminum-scandium alloy target materials

Examples

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Embodiment 1

[0027] A method for preparing an aluminum-scandium alloy target provided in this embodiment includes the following specific steps:

[0028] Step 1. Select metal aluminum powder with a purity of more than 99.5% and a particle size of 10 μm to 165 μm, and select metal scandium powder with a purity of more than 99.5% and a particle size of 10 μm to 240 μm, and the content of the metal aluminum powder is 50% to 98% by mass. %, the mass percentage of metal scandium powder is 2% to 50%, and the mass ratio requires that the two powders be mixed evenly;

[0029] Step 2. Put the mixed powder mixed in step 1 into the mold, and pre-compact at room temperature, and the pre-compact compaction force is 20-35MPa;

[0030] Step 3. Put the pre-compressed mold into the vacuum hot press, and the vacuum hot press is vacuumed to 6.7×10 -2 ~6.7×10 -3 After Pa, it enters the sintering stage and then cools to room temperature; among them, the sintering stage includes a low temperature stage and a h...

Embodiment 2

[0037] On the basis of the above-mentioned embodiment 1, this embodiment further provides a specific method for preparing an aluminum-scandium alloy target:

[0038] In this example, in order to prepare an aluminum-scandium alloy target with a composition of 50%Al-50%Sc, scandium powder with a purity of 99.5% and aluminum powder with a purity of 99.5% are used as raw materials; The particle size is 10 μm, and the average particle size of aluminum powder is 10 μm;

[0039]Proportion the aluminum powder and scandium powder in a ratio of 1:1, use an electronic balance to weigh the two powders according to their mass, and then put the mixed powder into the mixing cylinder of the three-dimensional mixing machine with protective gas for mixing , the mixing time is 40min, so that the two powders are completely mixed evenly;

[0040] Put the mixed scandium powder and aluminum powder into a special mold for sintering, and then pre-compact at room temperature, the pre-compact compactio...

Embodiment 3

[0045] On the basis of the above-mentioned embodiment 1, this embodiment further provides a specific method for preparing an aluminum-scandium alloy target:

[0046] In this example, in order to prepare an aluminum-scandium alloy target with a composition of 70%Al-30%Sc, scandium powder with a purity of 99.7% and aluminum powder with a purity of 99.6% are used as raw materials; The particle size is 75 μm, and the average particle size of aluminum powder is 38 μm;

[0047] Mix the aluminum powder and scandium powder in a ratio of 7:3, weigh the two powders by mass with an electronic balance, and then put the mixed powder into the mixing cylinder of the three-dimensional mixing machine with protective gas for mixing , the mixing time is 50min, so that the two powders are completely mixed evenly;

[0048] Put the mixed scandium powder and aluminum powder into a special mold for sintering, and then pre-compact at room temperature. The pre-compact compaction force is 30MPa; In th...

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Abstract

The invention discloses a preparation method for aluminum-scandium alloy target materials. The preparation method comprises the following specific steps of selecting metallic aluminum powder with thepurity of 99.5% or above and the particle size of 10-165 [mu]m, and metallic scandium powder with the purity of 99.5% or above and the particle size of 10-240 [mu]m, and uniformly mixing the metallicaluminum powder and the metallic scandium powder according to the mass ratio that the metallic aluminum powder accounts for 50%-98% and the metallic scandium powder accounts for 2%-50% by mass; putting the mixed powder into a mould, and pre-pressing the mould at room temperature with the pre-pressing force of 20-35 MPa; putting the pre-pressed mould into a vacuum hot press which is vacuumized to 6.7x10<2>-6.7x10<3> Pa, entering a sintering stage, and then cooling the mould to the room temperature; after cooling the mould to the room temperature, releasing vacuum and removing the mould pressureso that the aluminum-scandium alloy target materials are obtained; the relative density of the aluminum-scandium alloy target materials is high through the dual effects of pressure application and sintering; and the composition proportion can be regulated within a larger range.

Description

technical field [0001] The invention relates to the technical field of metal and alloy target processing and preparation, in particular to a method for preparing an aluminum-scandium alloy target for vacuum sputtering coating. Background technique [0002] Metal and alloy targets are used for sputtering coatings. Metal and alloy atoms on the surface of the target are sputtered out in the form of ions and deposited on the surface of the substrate to form a thin film. The coating of materials can improve the surface hardness, wear resistance, corrosion resistance and heat resistance of materials, realize the surface modification of materials, and meet the requirements of use; use vacuum magnetron sputtering to coat the required functional film on the surface of various materials , to obtain different functional characteristics, is a green and environmentally friendly surface treatment process that has been widely used at home and abroad in recent years, and the key material fo...

Claims

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Application Information

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IPC IPC(8): C23C14/34B22F1/00B22F3/14C22C21/00
Inventor 余鹏宋觉敏
Owner CHANGSHA XUNYANG NEW MATERIAL TECH CO LTD
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