Organic thin film transistor containing dual dielectric layers and fabrication method of organic thin film transistor
An organic thin film and transistor technology, applied in the field of organic thin film transistors and their preparation, can solve problems such as thermal and electrical instability of transistors, and achieve the effects of improving thermal stability, reducing dark current, and improving on-off ratio.
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[0071] The present invention also provides a preferred embodiment of the above-mentioned method for preparing an organic thin film transistor, including:
[0072] Step A, making a first dielectric layer on the gate substrate;
[0073] Step B, making a fluorine-containing polyimide film on the first dielectric layer;
[0074] Step C, making an organic semiconductor layer on the fluorine-containing polyimide film;
[0075] Step D, making an electrode on the fluorine-containing polyimide film with an organic semiconductor layer, both the organic semiconductor layer and the fluorine-containing polyimide film are overlapped with the electrode, and the organic thin film transistor is fabricated.
[0076] For the first dielectric layer, when selecting inorganic dielectric materials to make the dielectric layer, magnetron sputtering can be used; when polymer materials are used to make the dielectric layer, thermal evaporation, scrape coating or spin coating can be used. Made by pain...
Embodiment 1
[0082] Embodiment 1 is made to contain ODA-6FDA PI / SiO 2 Organic Thin Film Transistor with Double Dielectric Layer
[0083] (1) Use n-type doped polysilicon Si as the gate substrate, and form a layer of 300nm SiO on the Si substrate by thermal oxidation 2 as the first dielectric layer.
[0084] (2) Then cleaning, the cleaning steps are as follows: the gate substrate formed with the first layer of dielectric layer is immersed in deionized water, acetone and isopropanol successively, each ultrasonic 15 minutes, and use N 2 Blow dry, UV ozone treatment for 30min.
[0085] (3) ODA (4,4'-diaminodiphenyl ether) and 6FDA (4,4'-(hexafluoroisopropylene) diphthalic anhydride) were added to NMP successively in a molar ratio of 1:1, and the Stir in a water bath for 24h to form a solution with a mass fraction of ODA-6FDA PAA (fluorine-containing polyamic acid) of 10%, then dilute it to a mass fraction of 3.33% with a DMF solvent, and spin-coat the obtained dilution on the first dielectr...
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