Colored photosensitive resin composition, color filter and image display device manufactured using the same
A technology of photosensitive resin and composition, which can be used in photosensitive materials, instruments, optics and other directions for optomechanical equipment, and can solve problems such as unfavorable brightness and reliability.
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Examples
Synthetic example 1
[0235] Add 30 g of methanol to 2 g of dodecylpyridinium chloride, and slowly drop into the completely dissolved solution to dissolve 6 g of phosphotungstic acid hydrate (Aldrich, P4006) in Solution in 25g of water. After the dropwise addition, the precipitate was stirred at 25 to 50°C for 4 hours, and the precipitate was filtered and washed with water. After filtration, it was dried in a vacuum oven at 50° C. for 12 hours to obtain 8.5 g of the following chemical formula A-1 (refer to Eur.J.Inorg.Chem.2014, 21-35 for synthesis.)
[0236] [Chemical formula A-1]
[0237]
Synthetic example 2
[0238] Synthesis Example 2: Synthesis of Binder Resin (B)
[0239] Add 100 g of propylene glycol monomethyl ether acetate and 100 g of propylene glycol monomethyl ether into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction pipe, and change the atmosphere in the flask from air to nitrogen. 8.2 g of azobisisobutyronitrile, 3.1 g of monomethacrylate with a tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.), 55.2 g of 2-ethylhexyl acrylate, and 4-methyl 5.9 g of styrene, 85.2 g of glycidyl methacrylate, and 6.0 g of n-dodecyl mercaptan. Then, the temperature of the reaction liquid was raised to 80° C. while stirring, and the reaction was carried out for 4 hours.
[0240]The temperature of the reaction solution was lowered to normal temperature, and the atmosphere of the flask was replaced with air from nitrogen, then 0.2 g of triethylamine, 0.1 g of 4-methoxyphenol, 43.2 g of acrylic aci...
manufacture example
[0257] Color filters were produced using the colored photosensitive resin compositions produced in Examples and Comparative Examples. That is, each colored photosensitive resin composition described above was coated on a glass substrate by a spin coating method, placed on a hot plate, and maintained at a temperature of 100° C. for 3 minutes to form a thin film. Next, a test photomask having a pattern with a stepwise change in transmittance in the range of 1 to 100% and a line / space pattern of 1 μm to 50 μm was placed on the above-mentioned film, and the distance from the test photomask was 100 μm. UV rays were irradiated. At this time, for the light source of ultraviolet rays, a 1KW high-pressure mercury lamp containing all g, h, and i lines was used, and the light source was 100mJ / cm 2 illuminance without the use of special optical filters. The film irradiated with ultraviolet rays was immersed in a KOH aqueous developing solution having a pH of 10.5 for 2 minutes to be dev...
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