Preparing method of barium zirconate titanate thin film pressure control varactor
A technology of barium zirconate titanate and varactor, which is applied in voltage variable capacitors, ion implantation plating, coating, etc., can solve the problems of high dielectric loss, unfavorable system miniaturization, low power consumption and low cost, etc. , to achieve the effect of high tuning rate, good application prospect and excellent electrical performance
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Embodiment 1
[0022] 1. The BZT target is prepared by the solid-state sintering method, and the BaZr is pressed with an electronic balance. 0.2 Ti 0.8 o 3 Weigh BaCO corresponding to the stoichiometric ratio 3 , ZrO 2 and TiO 2 , The raw material quality purity is 99%. After being fully mixed, it is pressed into a green body, and the green body is placed in a box-type electric furnace and gradually heated to 1200 ° C, and kept for 6 hours to obtain BaZr 0.2 Ti 0.8 o 3 (BZT) target.
[0023] 2. The Pt-Si substrate was ultrasonically cleaned with acetone, ethanol and deionized water, and then cleaned with N 2 Blow dry and put on the pulsed laser deposition product table, the distance between target and base is 6cm.
[0024] 3. Pump the background vacuum of the pulsed laser deposition system to 3.0×10 -4 Pa, and then heat the substrate, the substrate temperature is 700 °C.
[0025] 4. Pass high-purity (99.99%) O 2 , the oxygen pressure is 0.8Pa, and the BaZr with a thickness of 250...
Embodiment 2
[0030] 1. The BZT target is prepared by the solid-state sintering method, and the BaZr is pressed with an electronic balance. 0.2 Ti 0.8 o 3 Weigh BaCO corresponding to the stoichiometric ratio 3 , ZrO 2 and TiO 2 , The raw material quality purity is 99%. After being fully mixed, pressed and formed, and finally placed in a box-type electric furnace, the temperature was gradually raised to 1200 ° C and kept for 6 hours to obtain BaZr 0.2 Ti 0.8 o 3 target.
[0031] 2. The Pt-Si substrate was ultrasonically cleaned with acetone, ethanol and deionized water, and then cleaned with N 2 Blow dry and put on the pulsed laser deposition product table, the distance between target and base is 6cm.
[0032] 3. Pump the background vacuum of the pulsed laser deposition system to 3.0×10 -4 Pa, and then heat the substrate, the substrate temperature is 700 °C.
[0033] 4. Pass high-purity (99.99%) O 2 , the oxygen pressure is 15Pa, and the BaZr with a thickness of 250nm is deposite...
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