Semipermeable membrane mask plate LCVD repair system

A mask plate and semi-permeable membrane technology, applied in the field of semi-permeable film mask plate LCVD repair system, can solve problems such as difficulties

Pending Publication Date: 2018-02-09
深圳清溢光电股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using the above optical system requires the laser energy to be irradiated on the iris diaphragm to be very uniform, which is quite difficult

Method used

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  • Semipermeable membrane mask plate LCVD repair system
  • Semipermeable membrane mask plate LCVD repair system

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Embodiment Construction

[0019] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings. It should be noted here that the descriptions of these embodiments are used to help understand the present invention, but are not intended to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below may be combined with each other as long as they do not constitute a conflict with each other.

[0020] Such as figure 1 As shown, a semi-permeable mask plate LCVD repair system, a laser 10, a grating light valve 14, a filter assembly 15, a vibrating mirror 16 and an objective lens assembly 18, the light source emitted by the laser 10 is shaped into a line light source, the The line light source is irradiated on the grating light valve 14 and reflected to form a uniform line light source. After the uniform line light source is irradiated on the vibrating mirror 16,...

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Abstract

The invention discloses a semipermeable membrane mask plate LCVD repair system. By adopting a laser scanning mode, the scanning light spot is smaller than 1 micron, and a chromium layer with controllable thickness and uniformity can be scanned and deposited uniformly, so that semipermeable membrane mask plate repair is realized. The repair system comprises a laser device, an optical grating lightvalve, a filtering assembly, a galvanometer and an objective lens assembly, wherein a light source emitted by the laser device is shaped into a linear light source; the linear light source is reflected after being irradiated onto the optical grating light valve to form a uniform linear light source; the uniform liner light source is gathered and irradiated onto the mask plate through the objectivelens assembly after being irradiated into the objective lens; the mask plate is arranged on an XY platform; a square uniform laser scanning light spot is formed by the objective lens on the mask plate; chromium carbonyl is decomposed, and chromium is deposited onto the mask plate.

Description

technical field [0001] The invention relates to the technical field of reticle making, in particular to an LCVD repair system for a semipermeable film reticle. Background technique [0002] During IC processing, reticles and photomasks are used. We define a reticle as an image-containing tool that must be stepped and repeated for exposure of the entire substrate. Typically the size of the image is magnified to 2x to 20x the size of the image on the substrate, but in some cases an equal image is used. A photoreticle is defined as a tool that transfers a pattern to an entire silicon wafer (or to another photomask) in one exposure. Reticles have two applications: 1) Copying graphics onto working reticles. 2) Transfer the image directly to the silicon wafer in a step-and-repeat aligner. In a 1X stepper, the pattern on the reticle is as large as the pattern projected onto the wafer; in a scaled-down stepper, the pattern on the reticle is an enlarged image of the real device. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/72
CPCG03F1/72
Inventor 李跃松张建国罗俊辉
Owner 深圳清溢光电股份有限公司
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