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A kind of preparation method of high-purity strong dense max phase coating

A coating and dense technology, which is applied in the field of preparation of high-purity, strong and dense MAX phase coatings, can solve the problems of reducing the application economy of MAX phase coatings, the difficulty of making MAX phase composite targets, and the unfavorable application of MAX phase coatings. It is easy to uniformly deposit large areas, facilitates industrial applications, and has low cost effects

Active Publication Date: 2020-10-27
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the single arc method basically uses MAX phase composite targets or M-Al intermetallic compound targets when preparing MAX phase (A=Al) coatings. Layer application economy; and the MAX phase composite target or M-Al intermetallic compound target reduces the melting point of the target material due to the presence of Al, so that the surface of the MAX phase (A=Al) coating prepared by a single arc method combined with subsequent heat treatment is large There are many particles, loose structure, serious defects such as holes and microcracks, which are not conducive to the application of MAX phase coatings

Method used

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  • A kind of preparation method of high-purity strong dense max phase coating
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  • A kind of preparation method of high-purity strong dense max phase coating

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Experimental program
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Effect test

Embodiment 1

[0037] (1) Put the cleaned and dried substrate into the vacuum cavity.

[0038] (2) Introduce 40 sccm of argon gas into the vacuum chamber, set the current of the linear anode ion source to 0.2A, and the substrate negative bias voltage to -150V, and use the ionized argon ions to etch the substrate for 20 minutes.

[0039](3) The Ti transition layer was deposited by arc ion plating technology, the sputtering current was 60A, the Ar flow rate was 200sccm, the gas pressure was 1.0Pa, and the deposition thickness was 350nm.

[0040] (4) The TiN diffusion barrier was deposited by arc ion plating technology, the sputtering current was 60A, N 2 The flow rate is 500 sccm, the gas pressure is 5.0 Pa, and the deposition thickness is 500 nm.

[0041] (5) The Ti-Al-N coating is deposited by arc composite magnetron sputtering technology, the arc target is Ti target, the magnetron sputtering target is Al target, the substrate is placed between the arc and the magnetron sputtering target, a...

Embodiment 2

[0058] (1) Put the cleaned and dried substrate into the vacuum chamber.

[0059] (2) Introduce 40 sccm of argon gas into the vacuum chamber, set the current of the linear anode ion source to 0.2A, and the substrate negative bias voltage to -150V, and use the ionized argon ions to etch the substrate for 20 minutes.

[0060] (3) The Cr transition layer was deposited by arc ion plating technology, the sputtering current was 60A, the Ar flow rate was 200sccm, the gas pressure was 1.0Pa, and the deposition thickness was 350nm.

[0061] (4) The CrN diffusion barrier was deposited by arc ion plating technology, the sputtering current was 60A, N 2 The flow rate is 500 sccm, the gas pressure is 5.0 Pa, and the deposition thickness is 500 nm.

[0062] (5) The Cr-Al-C coating is deposited by arc composite magnetron sputtering technology, the arc target is Ti target, the magnetron sputtering target is Al target, the substrate is placed directly in front of the magnetron sputtering target...

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Abstract

The invention provides a preparation method for a high-purity high-density MAX phase coating. According to the method, an arc ion plating technology is combined with a magnetron sputtering technology,an M-position element is provided for the arc, an A-position Al element is provided for magnetron, nitrogen or hydrocarbon as reaction gas is introduced for deposition, then thermal treatment is adopted, and the high-purity high-density MAX phase coating is prepared. The prepared MAX phase coating is high in purity, good in compactness, free of a microdefect, high in preparation efficiency, low in cost and capable of overcoming the defects that large particles on the surface of a MAX phase coating prepared through a single arc method are excessive, the density is low, the efficiency is low bymeans of a magnetron sputtering method, and the defects are obvious and has the wide application prospects on the aspects of high-temperature protection, corrosion-resistant application and the like,and the industrial production of the MAX phase coating can be achieved easily.

Description

technical field [0001] The invention relates to the technical field of surface coatings, in particular to a preparation method of a high-purity, strong and dense MAX phase coating. Background technique [0002] The MAX phase is a new type of ternary compound with a layered structure, and its chemical formula can be expressed as M n+1 AX n , where M is a transition group metal element; A is a main group element, mainly referring to III A and IV A group elements; X is a C or N element; n is an integer from 1 to 6. The unique layered structure of the MAX phase material makes it have both the excellent properties of metals and ceramics, such as the thermal conductivity, electrical conductivity and machinability of metal materials and the low density, high elastic modulus and oxidation resistance of ceramic materials. In addition, the MAX phase The material also has good high damage tolerance, good thermal shock resistance, etc., so it has potential wide application prospects i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/32C23C14/35C23C14/22
Inventor 柯培玲王振玉李晓伟汪爱英张栋
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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