Lining positive bias porous baffle multi-level magnetic field arc ion plating method

Abstract

The invention discloses a lining positive bias porous baffle multi-level magnetic field arc ion plating method, belongs to the technical field of material surface treatment and aims at achieving the aim about removal of macroparticles and deposition ions polluting the pipe inner wall in a multi-level magnetic field filtering device and solving the problem about losses of arc plasmas in the transmitting process. The method comprises the steps that firstly, a workpiece to be coated is placed on a sample table in a vacuum chamber, a related power source is turned on, and an outer water cooling system is started; secondly, film deposition is conducted, when the vacuum degree in the vacuum chamber is smaller than 10<-4>Pa, inflation of working gas is conducted, the air pressure is adjusted, a coating power source is started, and meanwhile a bias power source is utilized for attracting arc plasmas at the position of an outlet and conducting energy adjustment; and through stopping and shielding of a lining positive bias porous baffle device, the inhibiting effect of a positive bias electric field and the filtering effect of a multi-level magnetic field, the macroparticle defect is effectively overcome, the transmission efficiency of the arc plasmas is guaranteed, needed technology parameters are set, and film preparing is conducted.

Description

technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method for a positive bias porous type baffle on the inner lining, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles pe...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-level magnetic field filtering method and the composite effect of the mechanical barrier shielding of the porous baffle's own structure and the positive bias electric field attraction, at the same time ensure that the arc plasma passes through the porous baffle and the multi-hole with high transmission efficiency. The high-grade magnetic field filter device enables continuous and dense preparation of high-quality thin films on the surface of the workpiece under the condition of applying negative bias voltage. The adverse effects of particle defects on film growth and performance, a multi-stage magnetic field arc ion plating method lined with positive bias porous baffles was proposed

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