CuZnSnS-perovskite-based planar heterojunction solar cell and manufacturing method thereof
A solar cell, copper-zinc-tin-sulfur technology, applied in the direction of circuits, photovoltaic power generation, electrical components, etc., can solve the problems of unfavorable solar cell promotion and application, high cost of Spiro-OMeTAD, etc., achieve high charge extraction efficiency, reduce application costs, The effect of large abundance
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Embodiment 1
[0033] The glass substrate covered with indium tin oxide was ultrasonically washed with detergent, acetone, and ethanol for 30 minutes, dried with a nitrogen gun, and treated with ultraviolet-ozone for 5 minutes. Put the substrate into the vacuum chamber and evacuate to 5×10 -6 Below torr (Torr), heat the substrate to 400°C, then pass in argon to keep the vacuum at 0.5Pa, and deposit a copper-zinc-tin-sulfur film of about 50nm by intermediate frequency magnetron sputtering. 1mmol of CH 3 NH 3 I and 1 mmol PbI 2Dissolve the powder into 1 mL of dimethylformamide (DMF) solution, then add 100 μL of dimethyl sulfoxide (DMSO) solution to the solution, take 50 μL of the solution and drop it on the surface of the copper-zinc-tin-sulfur film to make it fully Spread out, then rotate the sample, and then anneal the sample at 100°C for 10 minutes, and the thickness of the obtained film is about 300nm, which is the perovskite film layer. On the surface of the perovskite thin film, a Zn...
Embodiment 2
[0035] The glass substrate covered with indium tin oxide was ultrasonically washed with detergent, acetone, and ethanol for 30 minutes, dried with a nitrogen gun, and treated with ultraviolet-ozone for 5 minutes. Put the substrate into the vacuum chamber and evacuate to 5×10 -6 Below torr, the substrate was heated to 400°C, and then argon was introduced to keep the vacuum at 0.5Pa, and a copper-zinc-tin-sulfur film of about 50nm was deposited by intermediate frequency magnetron sputtering. 1.35 mmol of CH 3 NH 3 I and 1.35 mmol PbI 2 Dissolve the powder into 1 mL of dimethylformamide (DMF) solution, then add 100 μL of dimethyl sulfoxide (DMSO) solution to the solution, take 50 μL of the solution and drop it on the surface of the copper-zinc-tin-sulfur film to make it fully Spread out, then rotate the sample, and then anneal the sample at 100 °C for 10 min, and the thickness of the obtained film is about 400 nm. On the surface of the perovskite thin film, a ZnO electron tra...
Embodiment 3
[0037] The glass substrate covered with fluorine-doped tin oxide was ultrasonically washed with detergent, acetone, and ethanol for 30 minutes, dried with a nitrogen gun, and treated with ultraviolet-ozone for 5 minutes. Put the substrate into the vacuum chamber and evacuate to 5×10 -6 Below torr, the substrate was heated to 500°C, and then argon was introduced to keep the vacuum at 0.5Pa, and a copper-zinc-tin-sulfur film of about 50nm was deposited by intermediate frequency magnetron sputtering. 1mmol of CH 3 NH 3 I and 1 mmol PbI 2 Dissolve the powder into 1 mL of dimethylformamide (DMF) solution, then add 100 μL of dimethyl sulfoxide (DMSO) solution to the solution, take 50 μL of the solution and drop it on the surface of the copper-zinc-tin-sulfur film to make it fully Spread out, then rotate the sample, and then anneal the sample at 100 °C for 10 min, and the thickness of the obtained film is about 300 nm. On the surface of the perovskite thin film, a ZnO electron tr...
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