Enhanced-mode high electron mobility transistor, preparation method thereof, and semiconductor device
A high electron mobility, enhanced technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of increasing device leakage and reducing device breakdown voltage, so as to improve breakdown voltage and reduce leakage , the effect of reducing surface damage
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[0046] Based on the same inventive concept, the present invention provides a method for preparing an enhanced high electron mobility transistor, comprising the following steps:
[0047] S1: Prepare an epitaxial layer on the substrate, including preparing a barrier layer;
[0048] S2: depositing a passivation layer on the barrier layer;
[0049] S3: Preparing a secondary epitaxial mask for selected areas;
[0050] S4: In the local area of the secondary epitaxial mask of the selected area, etch down from the barrier layer to prepare grooves;
[0051] S5: growing a p-type layer on the selective secondary epitaxial mask region and the groove;
[0052] S6: Prepare the source and drain electrodes, wherein the drain electrode is in contact with the p-type layer metal grown on the non-groove;
[0053] S7: preparing a gate electrode on the surface of the p-type layer grown in the groove.
[0054] Preferably, the doping concentration of the p-type layer is 1×10 16 -1×10 22 cm -3 ...
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